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A quantum efficiency analytical model for complementary metal–oxide–semiconductor image pixels with a pinned photodiode structure |
Cao Chen (曹琛), Zhang Bing (张冰), Wu Long-Sheng (吴龙胜), Li Na (李娜), Wang Jun-Feng (王俊峰) |
Xi'an Microelectronics Technology Institute, Xi'an 710071, China |
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Abstract A quantum efficiency analytical model for complementary metal–oxide–semiconductor (CMOS) image pixels with a pinned photodiode structure is developed. The proposed model takes account of the non-uniform doping distribution in the N-type region due to the impurity compensation formed by the actual fabricating process. The characteristics of two boundary PN junctions located in the N-type region for the particular spectral response of a pinned photodiode, are quantitatively analyzed. By solving the minority carrier steady-state diffusion equations and the barrier region photocurrent density equations successively, the analytical relationship between the quantum efficiency and the corresponding parameters such as incident wavelength, N-type width, peak doping concentration, and impurity density gradient of the N-type region is established. The validity of the model is verified by the measurement results with a test chip of 160× 160 pixels array, which provides the accurate process with a theoretical guidance for quantum efficiency design in pinned photodiode pixels.
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Received: 18 May 2014
Revised: 24 June 2014
Accepted manuscript online:
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PACS:
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42.79.Pw
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(Imaging detectors and sensors)
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85.30.-z
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(Semiconductor devices)
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78.40.Fy
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(Semiconductors)
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Fund: Project supported by the National Defense Pre-Research Foundation of China (Grant No. 51311050301095). |
Corresponding Authors:
Cao Chen
E-mail: intercaochen@163.com
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Cite this article:
Cao Chen (曹琛), Zhang Bing (张冰), Wu Long-Sheng (吴龙胜), Li Na (李娜), Wang Jun-Feng (王俊峰) A quantum efficiency analytical model for complementary metal–oxide–semiconductor image pixels with a pinned photodiode structure 2014 Chin. Phys. B 23 124215
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