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Chin. Phys. B, 2013, Vol. 22(11): 118504    DOI: 10.1088/1674-1056/22/11/118504
INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY Prev   Next  

Efficiency enhancement of an InGaN light-emitting diode with a p-AlGaN/GaN superlattice last quantum barrier

Xiong Jian-Yong (熊建勇)a, Zhao Fang (赵芳)a, Fan Guang-Han (范广涵)a, Xu Yi-Qin (许毅钦)b, Liu Xiao-Ping (刘小平)a, Song Jing-Jing (宋晶晶)a, Ding Bin-Bin (丁彬彬)a, Zhang Tao (张涛)a, Zheng Shu-Wen (郑树文)a
a Laboratory of Nanophotonic Functional Materials and Devices, Institute of Optoelectronic Materials and Technology, South China Normal University, Guangzhou 510631, China;
b Guangdong General Research Institute for Industrial Technology, Guangzhou 510650, China
Abstract  In this study, the efficiency droop of an InGaN light-emitting diode (LED) is reduced significantly by using a p-AlGaN/GaN superlattice last quantum barrier. The reduction in efficiency droop is mainly caused by the decrease of electron current leakage and the increase of hole injection efficiency, which is revealed by investigating the light currents, internal quantum efficiencies, energy band diagrams, carrier concentrations, carrier current densities, and radiative recombination efficiencies of three LED structures with the advanced physical model of semiconductor device (APSYS).
Keywords:  light-emitting diodes      p-AlGaN/GaN superlattice      last quantum barrier      efficiency droop  
Received:  06 March 2013      Revised:  12 July 2013      Accepted manuscript online: 
PACS:  85.60.Jb (Light-emitting devices)  
  73.61.Ey (III-V semiconductors)  
  78.60.Fi (Electroluminescence)  
  87.15.A- (Theory, modeling, and computer simulation)  
Fund: Project supported by the National Natural Science Foundation of China (Grant No. 61176043), the Special Funds for Provincial Strategic and Emerging Industries Projects of Guangdong Province, China (Grant Nos. 2010A081002005, 2011A081301003, and 2012A080304016), the First Phase of Construction of Guangdong Research Institute of Semiconductor Lighting Industrial Technology, China (Grant No. 2010A081001001), the High Efficiency LED Epitaxy and Chip Structure and Key Technology for Industrialization, China (Grant No. 2012A080302002), and the Youth Funding of South China Normal University (Grant No. 2012KJ018).
Corresponding Authors:  Zheng Shu-Wen     E-mail:  LED@scnu.edu.cn

Cite this article: 

Xiong Jian-Yong (熊建勇), Zhao Fang (赵芳), Fan Guang-Han (范广涵), Xu Yi-Qin (许毅钦), Liu Xiao-Ping (刘小平), Song Jing-Jing (宋晶晶), Ding Bin-Bin (丁彬彬), Zhang Tao (张涛), Zheng Shu-Wen (郑树文) Efficiency enhancement of an InGaN light-emitting diode with a p-AlGaN/GaN superlattice last quantum barrier 2013 Chin. Phys. B 22 118504

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