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Effects of hole-injection through side-walls of large V-pits on efficiency droop in Ⅲ-nitride LEDs |
Dong-Yan Zhang(张东炎)1,2, Jie Zhang(张洁)3, Xiao-Feng Liu(刘晓峰)1,2, Sha-Sha Chen(陈沙沙)1,2, Hui-Wen Li(李慧文)1,2, Ming-Qing Liu(刘明庆)1,2, Da-Qian Ye(叶大千)1,2, Du-Xiang Wang(王笃祥)1,2 |
1 Tianjin San'an Optoelectronics Co., Ltd, No. 20 Haitainan Road, Huayuan New Technology Industry Development Area, Tianjin 300384, China;
2 The Key Laboratory of Semiconductor LED Chip of Tianjin, No. 20 Haitainan Road, Huayuan New Technology Industry Development Area, Tianjin 300384, China;
3 Xiamen San'an Optoelectronics Technology Co., Ltd, No. 1721-1725, Luling Road, Xiamen 361009, China |
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Abstract Although the solid-state lighting market is growing rapidly, it is still difficult to obtain ultra-high brightness white light emitting diodes (LEDs). V-pits are inevitably introduced during the metalorganic chemical vapor deposition (MOCVD) growth of multiple quantum wells (MQWs) in Ⅲ-nitride LEDs, and thus affecting the carrier dynamics of the LEDs. Specifically designed structures are fabricated to study the influence of the V-pits on the hole transportation and efficiency droop, and double quantum wells (QWs) are used to monitor the transportation and distribution of holes based on their emission intensity. It is found that when compared with the planar QWs, the injection of holes into the QWs through the side walls of the V-pits changes the distribution of holes among the MQWs. This results in a higher probability of hole injection into the middle QWs and enhanced emission therein, and, consequently, a lower efficiency droop.
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Received: 09 October 2018
Revised: 11 February 2019
Accepted manuscript online:
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PACS:
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85.30.-z
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(Semiconductor devices)
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66.70.Df
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(Metals, alloys, and semiconductors)
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72.20.-i
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(Conductivity phenomena in semiconductors and insulators)
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Fund: Project supported by the National Key Research and Development Project of China (Grant No. 2017YFB0403303) and the Key Technologies Research and Development Program of Tianjin, China (Grant Nos. 18YFZCGX00760 and 18YFZCGX00400). |
Corresponding Authors:
Dong-Yan Zhang
E-mail: dyzhang2012@sanan-e.com
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Cite this article:
Dong-Yan Zhang(张东炎), Jie Zhang(张洁), Xiao-Feng Liu(刘晓峰), Sha-Sha Chen(陈沙沙), Hui-Wen Li(李慧文), Ming-Qing Liu(刘明庆), Da-Qian Ye(叶大千), Du-Xiang Wang(王笃祥) Effects of hole-injection through side-walls of large V-pits on efficiency droop in Ⅲ-nitride LEDs 2019 Chin. Phys. B 28 048501
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[1] |
Schubert E F and Kim J K 2005 Science 308 1274
|
[2] |
Krames M R, Shchekin O B, Mueller-Mach R, Mueller G O, Zhou L, Harbers G and Craford M G 2007 J. Disp. Technol. 3 160
|
[3] |
Tan C K, Zhang J, Li X H, Liu G, Tayo B O and Tansu N 2013 J. Disp. Technol. 9 272
|
[4] |
Yan Q X, Zhang S F, Long X M, Luo H J, Wu F, Fang L, Wei D P and Liao M Y 2016 Chin. Phys. Lett. 33 078501
|
[5] |
Verzellesi G, Saguatti D, Meneghini M, Bertazzi F, Goano M, Meneghesso G and Zanoni E 2013 J. Appl. Phys. 114 071101
|
[6] |
Akyol F, Nath D, Krishnamoorthy S, Park P and Rajan S 2012 Appl. Phys. Lett. 100 111118
|
[7] |
Xu J, Schubert M F, Zhu D, Cho J, Schubert E F, Shim H and Sone C 2011 Appl. Phys. Lett. 99 041105
|
[8] |
Park J H, Yeong Kim D, Hwang S, Meyaard D, Fred Schubert E, Dae Han Y, Won Choi J, Cho J and Kyu Kim J 2013 Appl. Phys. Lett. 103 061104
|
[9] |
Chang C Y, Li H, Shih Y T and Lu T C 2015 Appl. Phys. Lett. 106 091104
|
[10] |
Nakamura S 1998 Science 281 956
|
[11] |
Yakimov E B 2016 Jpn. J. Appl. Phys. 55 05FH04
|
[12] |
Hangleiter A, Hitzel F, Netzel C, Fuhrmann D, Rossow U, Ade G and Hinze P 2005 Phys. Rev. Lett. 95 127402
|
[13] |
Okada N, Kashihara H, Sugimoto K, Yamada Y and Tadatomo K 2015 J. Appl. Phys. 117 025708
|
[14] |
Sheen M H, Kim S D, Lee J H, Shim J I and Kim Y W 2015 J. Electron. Mater. 44 4134
|
[15] |
Kim J, Kim J, Tak Y, Chae S, Kim J Y and Park Y 2013 IEEE Electron Dev. Lett. 34 1409
|
[16] |
Le L, Zhao D, Jiang D, Li L, Wu L, Chen P, Liu Z, Li Z, Fan Y and Zhu J 2012 Appl. Phys. Lett. 101 252110
|
[17] |
Quan Z, Wang L, Zheng C, Liu J and Jiang F 2014 J. Appl. Phys. 116 183107
|
[18] |
Kim J, Cho Y H, Ko D S, Li X S, Won J Y, Lee E, Park S H, Kim J Y and Kim S 2014 Opt. Express 22 A857
|
[19] |
Li Y, Yun F, Su X, Liu S, Ding W and Hou X 2014 J. Appl. Phys. 116 123101
|
[20] |
Kumakura K, Makimoto T, Kobayashi N, Hashizume T, Fukui T and Hasegawa H 2005 Appl. Phys. Lett. 86 052105
|
[21] |
Ryou J H, Yoder P D, Liu J, Lochner Z, Kim H, Choi S, Kim H J and Dupuis R D 2009 IEEE J. Sel. Top. Quantum Electron. 15 1080
|
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