Residual gas properties in field emission device with ZnO emitters

doi:10.1088/1674-1056/22/6/068504

Abstract In this paper, a vacuum system is employed to compare the emission stabilities of the same ZnO cathode in a sealed field emission (FE) device and under ultrahigh vacuum (UHV) condition. It is observed that the emission current is more stable under the UHV level than that in the device. When all conditions except the ambient gases are kept unchanged, the emission current degradation is mainly caused by the residual gases in the sealed device. The quadrupole mass spectrometer (QMS) equipped on the vacuum system is used to investigate the residual gas components. Based on the QMS data obtained, the following conclusions can be drawn: the residual gases in ZnO-FE-devices are H₂, CH₄, CO, Ar, and CO₂. These residual gases can change the work function at the surface through adsorption or ion bombardment, thereby degrading the emission current of the cathode.

Keywords: residual gas ZnO field emission degradation vacuum

Received: 23 October 2012
Revised: 04 January 2013
Accepted manuscript online:

PACS:	85.45.-Db
	85.45.-w	(Vacuum microelectronics)

Fund: Project supported by the National Natural Science Foundation of China (Grant No. 60904023).

Corresponding Authors: Wang Jin-Chan
E-mail: Wang4712279@163.com

Cite this article:

Wang Jin-Chan (王金婵) Residual gas properties in field emission device with ZnO emitters 2013 Chin. Phys. B 22 068504

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