Fabrication and optical properties of MgxZn1-xO thin films

doi:10.1088/1674-1056/19/1/018102

Abstract Mg

_{x}

Zn

_{1 - x}

O (

x \leq 0.3

) thin films have been prepared on silicon substrates by radio frequency magnetron sputtering at room temperature. The thin films have hexagonal wurtzite single-phase structure and a preferred orientation with the c-axis perpendicular to the substrates. The Mg content in the films is slightly larger than that in the targets. The refractive indices of Mg

_{x}

Zn

_{1 - x}

O films measured at room temperature by spectroscopic ellipsometry (SE) on the wavelength 632.8 nm are systematically decreased with the increasing of Mg content. Optical band gaps of Mg

_{x}

Zn

_{1 - x}

O films are determined by the transmittance spectra. With increasing Mg content, the absorption edges of Mg

_{x}

Zn

_{1 - x}

O films shift to higher energies and band gaps linearly increase from 3.24 eV at

x = 0

to 3.90 eV at

x = 0.30

.

Keywords: semiconductor thin films alloys optical properties

Received: 10 June 2009
Revised: 29 June 2009
Accepted manuscript online:

PACS:	68.55.A-	(Nucleation and growth)
	68.55.-a	(Thin film structure and morphology)
	78.20.Ci	(Optical constants (including refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity))
	78.66.Hf	(II-VI semiconductors)
	81.15.Cd	(Deposition by sputtering)

Fund: Project supported by the National Found for Fostering Talents of Basic Science (NFFTBS) of China (Grant No. J0730318) and the Natural Science Foundation of Shandong Province, China (Grant No. Y2007F02).

Cite this article:

Zhang Xi-Jian(张锡健), Yuan Hui-Min(袁慧敏), Wang Qing-Pu(王卿璞), Wang Tong(王统), and Ma Hong-Lei(马洪磊) Fabrication and optical properties of Mg_xZn_1-xO thin films 2010 Chin. Phys. B 19 018102

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Fabrication and optical properties of Mg_xZn_1-xO thin films