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Chinese Physics, 2006, Vol. 15(6): 1320-1324    DOI: 10.1088/1009-1963/15/6/031
CONDENSED MATTER: STRUCTURAL, MECHANICAL, AND THERMAL PROPERTIES Prev   Next  

Effect of substrate temperature and pressure on properties of microcrystalline silicon films

Wu Zhi-Meng (吴志猛)a, Lei Qing-Song (雷青松)a, Geng Xin-Hua (耿新华)b, Zhao Ying (赵颖)b, Sun Jian (孙建)b, Xi Jian-Ping (奚建平)a
a Institute of Micro/Nano Science and Technology, Shanghai Jiaotong University, Shanghai 200030, China; b Institute of Optoelectronics, Nankai University, Tianjin 300071, China
Abstract  In this paper intrinsic microcrystalline silicon films have been prepared by very high frequency plasma enhanced chemical vapour deposition (VHF-PECVD) with different substrate temperature and pressure. The film properties were investigated by using Raman spectra, x-ray diffraction, scanning electron microscope (SEM), and optical transmittance measurements, as well as dark conductivity. Raman results indicate that increase of substrate temperature improves the microcrystallinity of the film. The crystallinity is improved when the pressure increases from 50Pa to 80Pa and the structure transits from microcrystalline to amorphous silicon for pressure higher than 80Pa. SEM reveals the effect of substrate temperature and pressure on surface morphology.
Keywords:  microcrystalline silicon      VHF-PECVD      Raman spectra      SEM  
Received:  03 August 2005      Revised:  24 January 2006      Accepted manuscript online: 
PACS:  73.61.Cw (Elemental semiconductors)  
  62.50.-p (High-pressure effects in solids and liquids)  
  68.37.Hk (Scanning electron microscopy (SEM) (including EBIC))  
  78.20.Ci (Optical constants (including refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity))  
  78.30.Am (Elemental semiconductors and insulators)  
  81.15.Gh (Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))  

Cite this article: 

Wu Zhi-Meng (吴志猛), Lei Qing-Song (雷青松), Geng Xin-Hua (耿新华), Zhao Ying (赵颖), Sun Jian (孙建), Xi Jian-Ping (奚建平) Effect of substrate temperature and pressure on properties of microcrystalline silicon films 2006 Chinese Physics 15 1320

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