Abstract A method in which nanometre-thick film deposition was alternated with hydrogen plasma annealing (layer-by-layer method) was applied to fabricate hydrogenated amorphous carbon films in a conventional plasma-enhanced chemical vapour deposition system. It was found that the hydrogen plasma treatment could decrease the hydrogen concentration in the films and change the sp2/sp3 ratio to some extent by chemical etching. Blue photoluminescence was observed at room temperature, as a result of the reduction of sp2 clusters in the films.
Received: 27 September 2001
Revised: 29 October 2001
Accepted manuscript online:
PACS:
78.55.Qr
(Amorphous materials; glasses and other disordered solids)
Fund: Project supported by the National Natural Science Foundation of China (Grant No 59802004), and the Natural Science Foundation of Jiangsu Province, China (Grant No BK99047).
Cite this article:
Xu Jun (徐骏), Huang Xiao-Hui (黄晓辉), Li Wei (李伟), Wang Li (王立), Chen Kun-Ji (陈坤基) Photoluminescence of amorphous carbon films fabricated by layer-by-layer hydrogen plasma chemical annealing method 2002 Chinese Physics 11 502
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