Abstract Four kinds of a-Si: H films deposited in the PECVD system with different Ts are studied by 1H NMR technique. Direct evidence is given to confirm hydrogen atoms in the diluted and clustered phases. The local bonding configurations for hydrogen and the density of dangling bonds are analyzed by ESR and infrared absorption spectroscopy. The behaviour of hydrogen in a-Si; H films is discussed.
Received: 02 September 1993
Accepted manuscript online:
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