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Chin. Phys. B, 2025, Vol. 34(3): 035202    DOI: 10.1088/1674-1056/ada43d
PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES Prev   Next  

Simulation on atmospheric pressure barrier discharge with varying relative position between two wavy dielectric surfaces

Xue-Chen Li(李雪辰)1,2, Wen-Jie Wan(万文杰)1, Xiao-Qian Liu(刘晓倩)1, Mo Chen(陈墨)2, Kai-Yue Wu(吴凯玥)3, Jun-Xia Ran(冉俊霞)2, Xue-Xia Pang(庞学霞)4, Xue-Xue Zhang(张雪雪)4, Jia-Cun Wu(武珈存)4, Peng-Ying Jia(贾鹏英)1,2,†, and Hui Sun(孙辉)5
1 College of Physics Science and Technology, Hebei University, Baoding 071002, China;
2 Engineering Research Center of Zero-carbon Energy Buildings and Measurement Techniques, Ministry of Education, Baoding 071002, China;
3 Department of Electrical Engineering, Tsinghua University, Beijing 100084, China;
4 Hebei Key Laboratory of Photo-Electricity Information and Materials, Hebei University, Baoding 071002, China;
5 University of Chinese Academy of Sciences, College of Materials and Opto-Electronic Technology, Beijing 100049, China
Abstract  As a popular approach to producing atmospheric pressure non-thermal plasma, dielectric barrier discharge (DBD) has been extensively used in various application fields. In this paper, DBD with wavy dielectric layers is numerically simulated in atmospheric pressure helium mixed with trace nitrogen based on a fluid model. With varying relative position (phase difference ($\Delta \varphi $)) of the wavy surfaces, there is a positive discharge and a negative discharge per voltage cycle, each of which consists of a pulse stage and a hump stage. For the pulse stage, maximal current increases with increasing $\Delta \varphi $. Results show that DBD with the wavy surfaces appears as discrete micro-discharges (MDs), which are self-organized to different patterns with varying $\Delta \varphi $. The MDs are vertical and uniformly-spaced with $\Delta \varphi =$0, which are self-organized in pairs with $\Delta \varphi =\pi /4$. These MD pairs are merged into some bright wide MDs with $\Delta \varphi =\pi /2$. In addition, narrow MDs appear between tilted wide MDs with $\Delta \varphi=3\pi /4$. With $\Delta \varphi =\pi $, the pattern is composed of wide and narrow MDs, which are vertical and appear alternately. To elucidate the formation mechanism of the patterns with different $\Delta \varphi $, temporal evolutions of electron density and electric field are investigated for the positive discharge. Moreover, surface charge on the wavy dielectric layers has also been compared with different $\Delta \varphi $.
Keywords:  dielectric barrier discharge      wavy dielectric surface      micro-discharge      fluid model  
Received:  15 November 2024      Revised:  24 December 2024      Accepted manuscript online:  31 December 2024
PACS:  52.25.Mq (Dielectric properties)  
  52.30.-q (Plasma dynamics and flow)  
  52.65.-y (Plasma simulation)  
  52.65.Kj (Magnetohydrodynamic and fluid equation)  
Fund: Project supported by the National Natural Science Foundation of China (Grant Nos. 12375250, 11875121, 51977057, and 11805013), the Natural Science Foundation of Hebei Province, China (Grant Nos. A2020201025 and A2022201036), the Hebei Province Optoelectronic Information Materials Laboratory Performance Subsidy Fund Project (Grant No. 22567634H), the Funds for Distinguished Young Scientists of Hebei Province, China (Grant No. A2012201045), the Natural Science Interdisciplinary Research Program of Hebei University (Grant Nos. DXK201908 and DXK202011), and the Post-graduate’s Innovation Fund Project of Hebei University (Grant No. HBU2022bs004).
Corresponding Authors:  Peng-Ying Jia     E-mail:  plasmalab@126.com

Cite this article: 

Xue-Chen Li(李雪辰), Wen-Jie Wan(万文杰), Xiao-Qian Liu(刘晓倩), Mo Chen(陈墨), Kai-Yue Wu(吴凯玥), Jun-Xia Ran(冉俊霞), Xue-Xia Pang(庞学霞), Xue-Xue Zhang(张雪雪), Jia-Cun Wu(武珈存), Peng-Ying Jia(贾鹏英), and Hui Sun(孙辉) Simulation on atmospheric pressure barrier discharge with varying relative position between two wavy dielectric surfaces 2025 Chin. Phys. B 34 035202

[1] Brandenburg R 2017 Plasma Sources Sci. Technol. 26 053001
[2] Rincón R, Hendaoui A, Matos J and Chaker M 2016 J. Appl. Phys. 119 223303
[3] Shao T, Yang W J, Zhang C, Niu Z, Yan P and Schamiloglu E 2014 Appl. Phys. Lett. 105 071607
[4] Zheng J G 2021 Chin. Phys. B 30 034702
[5] Yang H S, Zhao G Y, Liang H andWei B 2020 Chin. Phys. B 29 105203
[6] Guo Y T, Fang M Q, Zhang L Y, Sun J J, Wang X X, Tie J F, Zhou Q, Zhang L Q and Luo H Y 2022 Appl. Phys. Lett. 121 074101
[7] Babaeva N Y, TianWand Kushner M J 2014 J. Appl. Phys. 47 235201
[8] Mei D H, Zhu X B, He Y L, Yan J D and Tu X 2015 Plasma Sources Sci. Technol. 24 015011
[9] Rathore V, Pandey A, Patel S, Dave H and Nema S 2024 Phys. Scr. 99 035602
[10] Li S J, Dang X Q, Yu X, Abbas G, Zhang Q and Cao L 2020 Chem. Eng. J. 388 124275
[11] Li X C, Chu J D, Zhang Q, Zhang P P, Jia P Y and Geng J L 2016 Appl. Phys. Lett. 109 204102
[12] Wu K Y,Wu J C, Jia B Y, Ren C H, Kang P C, Jia P Y and Li X C 2020 Phys. Plasmas 27 082308
[13] Shi J J, Liu D W and Kong M G 2006 Appl. Phys. Lett. 89 081502
[14] Liu J, Yang Y, Nie L, Liu D and Lu X 2024 J. Phys. D: Appl. Phys. 57 275201
[15] Pipa A V, Hink R, Foest R and Brandenburg R 2020 Plasma Sources Sci. Technol. 29 12LT01
[16] Zhang D X, Yu J X, Li M Y, Pan J, Liu F and Fang Z 2023 Plasma Sci. Technol. 25 114004
[17] Zhang J, Cheng W, Wang Y H and Wang D Z 2022 Phys. Plasmas 29 103505
[18] Gou X X, Yuan D K, Wang L J, Xie L J, Wei L S and Zhang G X 2023 Vacuum 212 112047
[19] Tang M, Tang J F, Zhou D S and Yu D R 2021 Phys. Plasmas 28 050701
[20] Hong Y, Ning W J, Dai D and Zhang Y H 2020 Phys. Plasmas 27 053510
[21] Zhang Y H, Ning W J, Dai D and Wang Q 2019 Plasma Sources Sci. Technol. 28 075003
[22] Liu G M, Chen L, Zhao Z B and Song P 2023 Chin. Phys. B 32 125205
[23] Bazinette R, Sadeghi N and Massines F 2020 Plasma Sources Sci. Technol. 29 095010
[24] Dai D, Hou H X and Hao Y B 2011 Appl. Phys. Lett. 98 131503
[25] Wu S, Wang Z, Huang Q J, Wang W, Yu S, Zou C L, Lu Y and Lu X P 2014 IEEE Trans. Plasma Sci. 42 2342
[26] Li Z Y, Jin S H, Xian Y B, Nie L L, Liu D W and Lu X P 2021 Plasma Sources Sci. Technol. 30 065026
[27] Jin S H, Zhao F, Nie L L, Liu D W and Lu X P 2022 Plasma Process. Polym. 19 2200021
[28] Jin S H, Li Z Y, Xian Y B, Nie L L and Lu X P 2022 High Voltage 7 98
[29] Polonskyi O, Hartig T, Uzarski J R and Gordon M J 2021 Appl. Phys. Lett. 119 211601
[30] Wang Q, NingWJ, Dai D and Zhang Y H 2019 Plasma Process. Polym. 17 1900182
[31] Liu K, Fang Z and Dai D 2023 Acta Phys. Sin. 72 135201 (in Chinese)
[32] Ren C H, He X R, Jia P Y, Wu K Y and Li X C 2020 Phys. Plasmas 27 113507
[33] Jia P Y, Ran J X, Wu J C, Wang D D, Wu K Y, He X R and Li X C 2022 J. Phys. D: Appl. Phys. 56 015203
[34] Jia P Y,WanWJ, Zhang L L, Ran J X,Wu K Y,Wu J C, Pang X X and Li X C 2023 AIP Adv. 13 065005
[35] Lazarou C, Belmonte T, Chiper A S and Georghiou G E 2016 Plasma Sources Sci. Technol. 25 055023
[36] Wang Q, Ning W J, Dai D, Zhang Y H and Ouyang J T 2019 J. Phys. D: Appl. Phys. 52 205201
[37] Hagelaar G J M and Pitchford L C 2005 Plasma Sources Sci. Technol. 14 722
[38] IST-Lisbon database (https://lxcat.net/)
[39] Li X C, Wang D D, Chen J Y, Wu J C, Zhao N, Jia P Y and Wu K Y 2022 Phys. Fluids 34 027112
[40] Zhang P and Kortshagen U 2006 J. Phys. D: Appl. Phys. 39 153
[41] Gao S H, Wang X C and Zhang Y T 2020 Acta Phys. Sin. 69 115204 (in Chinese)
[42] Wang J, Lei B Y, Li J, Xu Y G, Zhang J Y, Tang J, Wang Y S, Zhao W and Duan Y X 2019 Phys. Plasmas 26 013511
[43] Liu F C, Wang X F, He Y F and Dong L F 2016 Phys. Plasmas 23 032301
[44] Li X C, Zhang L L, Chen K, Ran J X, Pang X X and Jia P Y 2024 IEEE Trans. Plasma Sci. 52 1619
[45] Jahanbakhsh S, Brüeser V and Brandenburg R 2018 Plasma Sources Sci. Technol. 27 115011
[46] Luo H Y, Liang Z, Lv B, Wang X X, Guan Z C and Wang L M 2007 Appl. Phy. Lett. 91 221504
[47] Luo H Y, Liang Z, Wang X X, Guan Z C and Wang L N 2010 J. Phys. D: Appl. Phys. 43 155201
[48] Chen M, Dong X Q, Wu K Y, Ran J X, Jia P Y, Wu J C and Li X C 2024 Appl. Phy. Lett. 124 214102
[49] Sun Y Z, Dong K L, Xu Z L and Zhang Y 2018 Res. Phys. 11 999
[50] Lu B, Wang X X, Luo H Y and Liang Z 2009 Chin. Phys. B 18 646
[51] Li X C, Niu D Y, Xu L F, Jia P Y and Chang Y Y 2012 Chin. Phys. B 21 075204
[52] Huang Z M, Hao Y P, Yang L, Han Y X and Li L C 2015 Phys. Plasmas 22 123509
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