PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES |
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Spatial characteristics of nanosecond pulsed micro-discharges in atmospheric pressure He/H2O mixture by optical emission spectroscopy |
Chuanjie Chen(陈传杰)1, Zhongqing Fang(方忠庆)1, Xiaofang Yang(杨晓芳)1, Yongsheng Fan(樊永胜)2, Feng Zhou(周锋)1,†, and Rugang Wang(王如刚)1 |
1 School of Information Engineering, Yancheng Institute of Technology, Yancheng 224051, China; 2 School of Automotive Engineering, Yancheng Institute of Technology, Yancheng 224051, China |
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Abstract Atmospheric pressure micro-discharges in helium gas with a mixture of 0.5% water vapor between two pin electrodes are generated with nanosecond overvoltage pulses. The temporal and spatial characteristics of the discharges are investigated by means of time-resolved imaging and optical emission spectroscopy with respect to the discharge morphology, gas temperature, electron density, and excited species. The evolution of micro-discharges is captured by intensified CCD camera and electrical properties. The gas temperature is diagnosed by a two-temperature fit to the ro-vibrational OH(A2Σ+-X2Π, 0-0) emission band and is found to remain low at 425 K during the discharge pulses. The profile of electron density performed by the Stark broadening of Hα 656.1-nm and He I 667.8-nm lines is uniform across the discharge gap at the initial of discharge and reaches as high as 1023 m-3. The excited species of He, OH, and H show different spatio-temporal behaviors from each other by the measurement of their emission intensities, which are discussed qualitatively in regard of their plasma kinetics.
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Received: 29 August 2021
Revised: 28 September 2021
Accepted manuscript online: 11 October 2021
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PACS:
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52.50.Dg
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(Plasma sources)
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52.70.Kz
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(Optical (ultraviolet, visible, infrared) measurements)
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82.33.Xj
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(Plasma reactions (including flowing afterglow and electric discharges))
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Fund: Project supported by the National Natural Science Foundation of China (Grant No. 51806186), the Natural Science Foundation of the Jiangsu Higher Education Institutions of China (Grant No. 20KJB140025), the Natural Science Foundation of Jiangsu Province, China (Grant No. BK20181050), and the Scientific Research Project for the Introduction Talent of Yancheng Institute of Technology (Grant No. XJR2020). |
Corresponding Authors:
Feng Zhou
E-mail: zfycit@ycit.edu.cn
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Cite this article:
Chuanjie Chen(陈传杰), Zhongqing Fang(方忠庆), Xiaofang Yang(杨晓芳), Yongsheng Fan(樊永胜), Feng Zhou(周锋), and Rugang Wang(王如刚) Spatial characteristics of nanosecond pulsed micro-discharges in atmospheric pressure He/H2O mixture by optical emission spectroscopy 2022 Chin. Phys. B 31 025204
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[1] Bruggeman P J, Iza F and Brandenburg R 2017 Plasma Sources Sci. Technol. 26 123002 [2] Shao T, Wang R, Zhang C and Yan P 2018 High Volt. 3 14 [3] Li H, Yu D, Sun W, Liu D, Li J, Han X, Li Z, Sun B and Wu Y 2016 High Voltage Eng. 21 3697 [4] Bruggeman P J and Brandenburg R 2013 J. Phys. D:Appl. Phys. 46 464001 [5] Park G Y, Park S J, Choi M Y, Koo I G, Byun J H, Hong J W, Sim J Y, Collins G J and Lee J K 2012 Plasma Sources Sci. Technol. 21 043001 [6] Wang R, Xu H, Zhao Y, Zhu W, Ostrikov K and Shao T 2018 J. Phys. D:Appl. Phys. 52 074002 [7] Zhang L, Yang D, Wang S, Jia Z, Yuan H, Zhao Z and Wang W 2019 Nanomaterials 9 1381 [8] Huang B D, Takashima K, Zhu X M and Pu Y K 2014 IEEE Trans. Plasma Sci. 42 2642 [9] Pai D Z, Lacoste D A and Laux C O 2010 Plasma Sources Sci. Technol. 19 065015 [10] Verreycken T, van der Horst R M, Baede A H F M, van Veldhuizen E M and Bruggeman P J 2012 J. Phys. D:Appl. Phys. 45 045205 [11] Lo A, Cessou A, Lacour C, Lecordier B, Boubert P, Xu D A, Laux C O and Vervisch P 2017 Plasma Sources Sci. Technol. 26 045012 [12] Rusterholtz D L, Lacoste D A, Stancu G D, Pai D Z and Laux C O 2013 J. Phys. D:Appl. Phys. 46 464010 [13] Shao T, Zhang C, Niu Z, Yan P, Tarasenko V F, Baksht E Kh, Burahenko A G and Shutko Y V 2011 Appl. Phys. Lett. 98 021503 [14] Huang B D, Takashima K, Zhu X M and Pu Y K 2014 J. Phys. D:Appl. Phys. 47 422003 [15] Minesi N, Stepanyan S, Mariotto P, Stancu G D and Laux C O 2020 Plasma Sources Sci. Technol. 29 085003 [16] van der Horst R M, Verreycken T, van Veldhuizen E M and Bruggeman P J 2012 J. Phys. D:Appl. Phys. 45 345201 [17] Burnette D, Montello A, Adamovich I V and Lempert W R 2014 Plasma Sources Sci. Technol. 23 045007 [18] Simeni M S, Laux C O and Stancu G D 2017 J. Phys. D:Appl. Phys. 50 274004 [19] Verreycken T, van der Horst R M, Baede A H F M, van Veldhuizen E M and Bruggeman P J 2012 J. Phys. D:Appl. Phys. 45 045205 [20] Jung Y H, Jang S O and You H J 2013 Chin. Phys. Lett. 30 065204 [21] Qian M Y, Yang C Y, Wang Z D, Chen X C, Liu S Q and Wang D Z 2016 Chin. Phys. B 25 015202 [22] Verreycken T, Sadeghi N and Bruggeman P J 2014 Plasma Sources Sci. Technol. 23 045005 [23] Chen C, Fan Y, Fang Z, Wang Y, Kong W, Zhou F and Wang R 2021 Spectrosc. Spect. Anal. 41 2337 [24] NIST Atomic Spectra Database (ver. 5.7):http://physics.nist.gov/asd [25] Raizer Y R 1991 Gas Discharge Physics (Berlin:Springer) [26] Chen C J, Simeni M S, Li S Z, Barnat E V and Bruggeman P J 2020 Plasma Sources Sci. Technol. 29 035020 [27] Huang B D, Takashima K, Zhu X M and Pu Y K 2014 IEEE Trans. Plasma Sci. 42 2642 [28] Bruggeman P J, Sadeghi N, Schram D C and Linss V 2014 Plasma Sources Sci. Technol. 23 023001 [29] Copeland R A, Dyer M J and Crosley D R 1985 J. Chem. Phys. 82 4022 [30] Nikiforov A Y, Leys C, Gonzalez M A and Walsh J L 2015 Plasma Sources Sci. Technol. 24 034001 [31] Hofmann S, van Gessel A F H, Verreycken T and Bruggeman P 2011 Plasma Sources Sci. Technol. 20 065010 [32] Gigosos M A, Gonzalez M A and Cardenoso V 2003 Spectrochim. Acta B 58 1489 [33] Huang J, Yang L, Zhang H, Chen L and Wu X 2019 Chin. Phys. B 28 055202 [34] Verreycken T 2013 Spectroscopic investigation of OH dynamics in transient atmospheric pressure plasmas, PhD Dissertation (Eindhoven:Eindhoven University of Technology) [35] Liu D X, Bruggeman P, Iza F, Rong M Z and Kong M G 2010 Plasma Sources Sci. Technol. 19 025018 [36] Binns W R and Ahl J L 1978 J. Chem. Phys. 68 538 [37] Verreycken T, Sadeghi N and Bruggeman P J 2014 Plasma Sources Sci. Technol. 23 045005 |
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