| INSTRUMENTATION AND MEASUREMENT |
Next
|
|
|
Grating pitch comparison measurement based on Cr atomic transition frequency and Si lattice constant |
| Jingtong Feng(冯婧桐)1,2,3,4,5,6, Rao Xu(徐娆)1,2,3,4,5,6, Ziruo Wu(吴子若)7, Lihua Lei(雷李华)8, Yingfan Xiong(熊英凡)1,2,3,4,5,6, Zhaohui Tang(唐朝辉)1,2,3,4,5,6, Guangxu Xiao(肖光旭)1,2,3,4,5,6, Yuying Xie(解钰莹)1,2,3,4,5,6†, Dongbai Xue(薛栋柏)1,2,3,4,5,6, Xiao Deng(邓晓)1,2,3,4,5,6, Xinbin Cheng(程鑫彬)1,2,3,4,5,6, and Tongbao Li(李同保)1,2,3,4,5,6 |
1 National Metrology and Testing Center for Integrated Circuit Measurement and Inspection Equipment Industry (Shanghai), Tongji University, Shanghai 200092, China;
2 Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China;
3 MOE Key Laboratory of Advanced Micro-Structured Materials, Tongji University, Shanghai 200092, China;
4 Shanghai Frontiers Science Center of Digital Optics, Tongji University, Shanghai 200092, China;
5 Shanghai Professional Technical Service Platform for Full-Spectrum and High-Performance Optical Thin Film Devices and Applications, Tongji University, Shanghai 200092, China;
6 School of Physics Science and Engineering, Tongji University, Shanghai 200092, China;
7 Shanghai Metric Optics Technology Co., Ltd., Shanghai 201108, China;
8 Shanghai Institute of Measurement and Testing Technology, Shanghai 201203, China |
|
|
|
|
Abstract Traceability is the fundamental premise of all metrological activities. The establishment of a traceability chain characterized by a shortened structure, while simultaneously enabling on-site traceability, represents a key trend in the advancement of metrology. This study explores the periodic accuracy and overall uniformity of self-traceable gratings, employing multilayer film gratings with a nominal period of 25.00 nm as the medium. We present a comparative analysis of measurement capabilities in a self-traceable grating calibration system characterized by a ‘top-down’ calibration approach and a Si lattice constant calibration system characterized by a ‘bottom-up’ calibration approach. The results indicate that the values obtained for the multilayer film grating periods, calibrated using the self-traceable grating system, are 24.40 nm with a standard deviation of 0.11 nm. By comparing with the values derived from the Si lattice constant, which yield 24.34 nm with a standard deviation of 0.14 nm, the validity and feasibility of the self-traceable calibration system are confirmed. This system extends and complements existing metrological frameworks, offering a precise pathway for traceability in precision engineering and nanotechnology research.
|
Received: 29 September 2024
Revised: 12 November 2024
Accepted manuscript online: 13 December 2024
|
|
PACS:
|
06.20.-f
|
(Metrology)
|
| |
06.20.fb
|
(Standards and calibration)
|
| |
81.07.-b
|
(Nanoscale materials and structures: fabrication and characterization)
|
|
| Fund: Project supported by the National Natural Science Foundation of China (Grant Nos. 61925504 and 52475563), the National Key Research and Development Program of China (Grant Nos. 2022YFF0607600 and 2022YFF0605502), Key Laboratory of Metrology and Calibration Technology Fund Project (Grant No. JLKG2023001B001), and Aeronautical Science Foundation Project (Grant No. 20230056038001). |
Corresponding Authors:
Yuying Xie
E-mail: 23310117@tongji.edu.cn
|
Cite this article:
Jingtong Feng(冯婧桐), Rao Xu(徐娆), Ziruo Wu(吴子若), Lihua Lei(雷李华), Yingfan Xiong(熊英凡), Zhaohui Tang(唐朝辉), Guangxu Xiao(肖光旭), Yuying Xie(解钰莹), Dongbai Xue(薛栋柏), Xiao Deng(邓晓), Xinbin Cheng(程鑫彬), and Tongbao Li(李同保) Grating pitch comparison measurement based on Cr atomic transition frequency and Si lattice constant 2025 Chin. Phys. B 34 020601
|
[1] Dai G, Heidelmann M, Kubel C, Prang R, Fl ugge J and Bosse H 2013 Measurement Science and Technology 24 085001
[2] Orji N G, Badaroglu M, Barnes B M, Beitia C, Bunday B D, Celano U, Kline R J, Neisser M, Obeng Y and Vladar A E 2018 Nat. Electron. 1 532
[3] Deng X, Yin Z, Dai G, Xiao G, Tang Z, Shen J, Zhou T, Xue D, Xie Y and He C 2024 Measurement Science and Technology 35 125009
[4] Basile G, Bergamin A, Cavagnero G, Mana G, Vittone E and Zosi G 1994 Phys. Rev. Lett. 72 3133
[5] Dai G, Hu X and Degenhardt J 2022 Surface Topography: Metrology and Properties 10 015018
[6] Dirscherl K, Garnæs J, Nielsen L, Jørgensen J F and Sørensen M P 2000 Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement and Phenomena 18 621
[7] Wu Z, Cai Y, Wang X, Zhang L, Deng X, Cheng X and Li T 2019 Chin. Phys. B 28 030601
[8] McClelland J J, Scholten R E, Palm E C and Celotta R J 1993 Science 262 877
[9] McClelland J J, Anderson W R, Bradley C C, Walkiewicz M, Celotta R J, Jurdik E and Deslattes R D 2003 Journal of Research of the National Institute of Standards and Technology 108 99
[10] Misumi I, Lu M, Tanaka H, Sugawara K, Gonda S and Kurosawa T 2008 Measurement Science and Technology 19 045101
[11] Dai G, Koenders L, Pohlenz F, Dziomba T and Danzebrink H U 2005 Measurement Science and Technology 16 1241
[12] Chen J, Liu J, Wang X, Zhang L, Deng X, Cheng X and Li T 2017 Measurement Science Review 17 264
[13] Dahlen G, Osborn M, Okulan N, Foreman W, Chand A and Foucher J 2005 Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement and Phenomena 23 2297
[14] Binnig G, Quate C F and Gerber C 1986 Phys. Rev. Lett. 56 930
[15] Dai G, Hahm K, Bosse H and Dixson R G 2017 Measurement Science and Technology 28 065010
[16] Deng X, Li T and Cheng X 2022 Optics and Precision Engineering 30 2608
[17] Kuchibhatla S VNT, Karakoti A S, Bera D and Seal S 2007 Progress in Materials Science 52 699
[18] Misumi I, Dai G, Lu M, Sato O, Sugawara K, Gonda S, Takatsuji T, Danzebrink H U and Koenders L 2010 Measurement Science and Technology 21 035105
[19] Takenaka H, Hatayama M, Ito H, Ohchi T, Takano A, Kurosawa S, Itoh H and Ichimura S 2011 Journal of Surface Analysis 17 264
[20] Misumi I, Gonda S, Kurosawa T and Takamasu K 2003 Measurement Science and Technology 14 463
[21] Lin Z, Yao Y, Zhou T, Xue D, Gu Z, Deng X, Cheng X and Li T 2022 Metrology Science and Technology 66 3
[22] Deng X, Tan W, Tang Z, Lin Z, Cheng X and Li T 2022 Nanomanufacturing and Metrology 5 179 |
| No Suggested Reading articles found! |
|
|
Viewed |
|
|
|
Full text
|
|
|
|
|
Abstract
|
|
|
|
|
Cited |
|
|
|
|
Altmetric
|
|
blogs
Facebook pages
Wikipedia page
Google+ users
|
Online attention
Altmetric calculates a score based on the online attention an article receives. Each coloured thread in the circle represents a different type of online attention. The number in the centre is the Altmetric score. Social media and mainstream news media are the main sources that calculate the score. Reference managers such as Mendeley are also tracked but do not contribute to the score. Older articles often score higher because they have had more time to get noticed. To account for this, Altmetric has included the context data for other articles of a similar age.
View more on Altmetrics
|
|
|
