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Comparison of radiation degradation induced by x-rayand 3-MeV protons in 65-nm CMOS transistors |
Lili Ding(丁李利)1,2,3, Simone Gerardin2,3, Marta Bagatin2, Dario Bisello2, Serena Mattiazzo2, Alessandro Paccagnella2,3 |
1. State Key Laboratory of Intense Pulsed Radiation Simulation and Effect, Northwest Institute of Nuclear Technology, Xi'an 710072, China; 2. RREACT group, Department of Information Engineering, Padova University, Italy; 3. INFN, Padova, Italy |
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Abstract The total ionizing dose (TID) response of 65-nm CMOS transistors is studied by 10-keV x-ray and 3-MeV protons up to 1 Grad (SiO2) total dose. The degradation levels induced by the two radiation sources are different to some extent. The main reason is the interface dose enhancement due to the thin gate oxide and the low energy photons. The holes' recombination also contributes to the difference. Compared to these two mechanisms, the influence of the dose rate is negligible.
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Received: 02 January 2016
Revised: 09 May 2016
Accepted manuscript online:
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PACS:
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61.80.-x
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(Physical radiation effects, radiation damage)
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73.40.Qv
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(Metal-insulator-semiconductor structures (including semiconductor-to-insulator))
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Corresponding Authors:
Lili Ding
E-mail: lili03.ding@126.com
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Cite this article:
Lili Ding(丁李利), Simone Gerardin, Marta Bagatin, Dario Bisello, Serena Mattiazzo, Alessandro Paccagnella Comparison of radiation degradation induced by x-rayand 3-MeV protons in 65-nm CMOS transistors 2016 Chin. Phys. B 25 096110
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