Abstract The current voltage (IV) characteristics are greatly influenced by the dispersion effects in AlGaN/GaN high electron mobility transistors. The direct current (DC) IV and pulsed IV measurements are performed to give a deep investigation into the dispersion effects, which are mainly related to the trap and self-heating mechanisms. The results show that traps play an important role in the kink effects, and high stress can introduce more traps and defects in the device. With the help of the pulsed IV measurements, the trapping effects and self-heating effects can be separated. The impact of time constants on the dispersion effects is also discussed. In order to achieve an accurate static DC IV measurement, the steady state of the bias points must be considered carefully to avoid the dispersion effects.
Pu Yan(蒲颜), Pang Lei(庞磊), Chen Xiao-Juan(陈晓娟), Yuan Ting-Ting(袁婷婷), Luo Wei-Jun(罗卫军), and Liu Xin-Yu(刘新宇) Dispersion effect on the current voltage characteristic of AlGaN/GaN high electron mobility transistors 2011 Chin. Phys. B 20 097305
[1]
Chow T P and Tyagi R 1994 IEEE Trans. Electron Devices 41 1481
[2]
Yoder M N 1996 IEEE Trans. Electron Devices 43 1633
[3]
Chung J W, Hoke W E, Chumbes E M and Palacios T 2010 IEEE Electron Device Lett. 31 195
[4]
Nanjo T, Takeuchi M, Suita M, Oishi T, Abe Y, Tokuda Y and Aoyagi Y 2008 Appl. Phys. Lett. 92 263502
[5]
Ambacher O 1998 J. Phys. D: Appl. Phys. 31 2653
[6]
Peng D S, Feng Y C, Wang W X, Liu X F, Shi W and Niu H B 2006 Acta Phys. Sin. 55 3606 (in Chinese)
[7]
Edwards C F, Redman-White W, Tenbroek B M, Lee M S L and Uren M J 1997 IEEE Trans. Electron Devices 44 2290
[8]
Ernst A N, Somerville M H and Del Alamo J A 1997 IEEE Electron Device Lett. 18 613
[9]
Mazzanti A, Verzellesi G, Canali C, Meneghesso G and Zanoni E 2002 IEEE Electron Device Lett. 23 383
[10]
Meneghesso G, Zanon F, Uren M J and Zanoni E 2009 IEEE Electron Device Lett. 30 100
[11]
Wu Y F, Keller B P, Keller S, Xu J J, Thibeault B J, Denbaars S P and Mishra U K 1999 IEICE Trans. Electron. E82-C 1895
[12]
Wang L, Hu W D, Chen X S and Lu W 2010 Acta Phys. Sin. 59 5730 (in Chinese)
[13]
Vetury R, Zhang N Q, Keller S and Mishra U K 2001 IEEE Trans. Electron Devices 48 560
[14]
Binari S C, Ikossi K, Roussos J A, Kruppa W, Paker D, Dietrich H B, Koleske D D, Wickenden A E and Henry R L 2001 IEEE Trans. Electron Devices 48 465
[15]
Blight S R, Wallis R H and Thomas H 1986 IEEE Trans. Electron Devices 33 1447
[16]
Chikhaoui W, Bluet J M, Bru-Chevallier C, Dua C and Aubry R 2010 Phys. Status Solidi C 7 92
[17]
Gaska R, Osinsky A, Yang J W and Shur M S 1998 IEEE Electron Device Lett. 19 89
[18]
Kuball M, Hayes J M, Uren M J, Martin T, Birbeck J C H, Balmer R S and Hughes B T 2002 IEEE Electron Device Lett. 23 7
[19]
Zhang G C, Feng S W, Zhou Z, Li J W and Guo C S 2011 Chin. Phys. B 20 027202
[20]
Parker A E and Rathmell J G 2003 IEEE Trans. Microwave Theory Tech. 51 588
[21]
Golio J M, Miller M G, Maracas G N and Johnson D A 1990 IEEE Trans. Electron Devices 37 1217
[22]
Barton T M and Ladbrooke P H 1986 Solid-State Electron. 29 807
[23]
Ho W Y, Surya C, Tong K Y, Lu L W and Ge W K 2000 IEEE Trans. Electron Devices 47 1421
[24]
Lee J W and Webb K J 2004 IEEE Trans. Microwave Theory Tech. 52 2
[25]
Ren F, Hao Z B, Wang L, Wang L, Li H T and Luo Y 2010 Chin. Phys. B 19 017306
[26]
Scott J, Rathmell J G, Parker A and Sayed M 1996 IEEE Trans. Microwave Theory Tech. 44 2718
[27]
Ibbetson J P, Fini P T, Ness K D, Denbaars S P, Speck J S and Mishra U K 2000 Appl. Phys. Lett. 77 250
[28]
Binari S C, Klein P B and Kazior T E 2002 Proc. IEEE 90 1048
[29]
Meneghesso G, Paccagnella A, Haddab Y, Canali C and Zanoni E 1996 Appl. Phys. Lett. 69 1411
[30]
Dang X Z, Asbeck P M, Yu E T, Boutros K S and Redwing J M 2000 Proc. Mater. Res. Soc. Symp. 622 T6.28.1
[31]
Akhtar S, Roblin P, Lee S, Ding X H, Yu S, Kasick J and Strahler J 2002 IEEE Trans. Microwave Theory Tech. 50 1561
[32]
Sofia J W 1995 IEEE Trans. Compon. Packag. Manuf. Technol. (Part A:) 18 39
[33]
Baylis C P II, Dunleavy L P and Daniel J E 2004 IEEE MTT-S International Microwave Symposium Digest 2 1233
Degradation of gate-recessed MOS-HEMTs and conventional HEMTs under DC electrical stress Yi-Dong Yuan(原义栋), Dong-Yan Zhao(赵东艳), Yan-Rong Cao(曹艳荣), Yu-Bo Wang(王于波), Jin Shao(邵瑾), Yan-Ning Chen(陈燕宁), Wen-Long He(何文龙), Jian Du(杜剑), Min Wang(王敏), Ye-Ling Peng(彭业凌), Hong-Tao Zhang(张宏涛), Zhen Fu(付振), Chen Ren(任晨), Fang Liu(刘芳), Long-Tao Zhang(张龙涛), Yang Zhao(赵扬), Ling Lv(吕玲), Yi-Qiang Zhao(赵毅强), Xue-Feng Zheng(郑雪峰), Zhi-Mei Zhou(周芝梅), Yong Wan(万勇), and Xiao-Hua Ma(马晓华). Chin. Phys. B, 2021, 30(7): 077305.
No Suggested Reading articles found!
Viewed
Full text
Abstract
Cited
Altmetric
blogs
tweeters
Facebook pages
Wikipedia page
Google+ users
Online attention
Altmetric calculates a score based on the online attention an article receives. Each coloured thread in the circle represents a different type of online attention. The number in the centre is the Altmetric score. Social media and mainstream news media are the main sources that calculate the score. Reference managers such as Mendeley are also tracked but do not contribute to the score. Older articles often score higher because they have had more time to get noticed. To account for this, Altmetric has included the context data for other articles of a similar age.