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Chin. Phys. B, 2010, Vol. 19(9): 097807    DOI: 10.1088/1674-1056/19/9/097807
CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES Prev   Next  

Amorphous Er2O3 films for antireflection coatings

Zhu Yan-Yan(朱燕艳)a)†, Fang Ze-Bo(方泽波)b), and Liu Yong-Sheng(刘永生)a)
a Shanghai University of Electric Power, Shanghai 200090, China; b Department of Physics, Shaoxing University, Shaoxing 312000, China
Abstract  This paper reports that stoichiometric, amorphous, and uniform Er2O3 films are deposited on Si(001) substrates by a radio frequency magnetron sputtering technique. Ellipsometry measurements show that the refractive index of the Er2O3 films is very close to that of a single layer antireflection coating for a solar cell with an air surrounding medium during its working wavelength. For the 90-nm-thick film, the reflectance has a minimum lower than 3% at the wavelength of 600 nm and the weighted average reflectances (400–1000 nm) is 11.6%. The obtained characteristics indicate that Er2O3 films could be a promising candidate for antireflection coatings in solar cells.
Keywords:  Er2O3 film      optical constants      insulators      solar power  
Received:  03 November 2009      Revised:  25 February 2010      Accepted manuscript online: 
PACS:  7865  
  7850E  
  7820D  
  7755  
Fund: Project supported by the Special Project of Shanghai Nano-technology (Grant No. 0852nm02400), the National Natural Science Foundation of China (Grant Nos. 10804072 and 60806031), and the Key Fundamental Project of Shanghai (Grant No. 08JC1410400).

Cite this article: 

Zhu Yan-Yan(朱燕艳), Fang Ze-Bo(方泽波), and Liu Yong-Sheng(刘永生) Amorphous Er2O3 films for antireflection coatings 2010 Chin. Phys. B 19 097807

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