Temperature-driven spin reorientation transitionof magnetron sputtered nickel thin film

doi:10.1088/1674-1056/17/9/059

Abstract

Abstract The temperature-driven spin reorientation transition of magnetron sputtered Ni/Si (111) systems has been studied. The relationship between ac initial susceptibility and temperature of nickel films with different thicknesses shows that the magnetization orientation changes from in-plane to out-of-plane with the increase of temperature. The temperature dependence of magnetoelastic, magneto-crystalline, and magnetostatic anisotropies determines the direction of the reorientation transition. The temperature-driven spin reorientation transition is supported by Hall coefficient measurements which show that its temperature dependence is similar to that of susceptibility.

Keywords: magnetic anisotropy spin reorientation transition ac initial susceptibility

Received: 27 March 2008
Revised: 07 April 2008
Accepted manuscript online:

PACS:	75.70.Ak	(Magnetic properties of monolayers and thin films)
	72.15.Gd	(Galvanomagnetic and other magnetotransport effects)
	75.30.Cr	(Saturation moments and magnetic susceptibilities)
	75.30.Gw	(Magnetic anisotropy)
	75.30.Kz	(Magnetic phase boundaries (including classical and quantum magnetic transitions, metamagnetism, etc.))
	75.80.+q	(Magnetomechanical effects, magnetostriction)

Fund: Project supported by the National Natural Science Foundation of China (Grant No 10334080).

Cite this article:

Song Xiao-Hui(宋小会) and Zhang Dian-Lin(张殿琳) Temperature-driven spin reorientation transitionof magnetron sputtered nickel thin film 2008 Chin. Phys. B 17 3495

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Temperature-driven spin reorientation transitionof magnetron sputtered nickel thin film

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