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Chinese Physics, 2004, Vol. 13(1): 82-84    DOI: 10.1088/1009-1963/13/1/015
CONDENSED MATTER: STRUCTURAL, MECHANICAL, AND THERMAL PROPERTIES Prev   Next  

Effect of nonstoichiometry on Raman scattering of VO2 films

Yuan Hong-Tao (袁宏韬)ab, Feng Ke-Cheng (冯克成)a, Wang Xue-Jin (王学进)b, Li Chao (李超)a, He Chen-Juan (何琛娟)b, Nie Yu-Xin (聂玉昕)b
a Changchun University of Science and Technology, Changchun 130022, China; b Institute of Physics ,Chinese Academy of Sciences, Beijing 100080, China
Abstract  We report on Raman scattering of VO$_2$ films prepared by radio frequency magnetron sputtering under different conditions. Our investigations revealed that the dominated Raman peaks shift towards high frequency for both V-rich and O-rich VO$_2$ films, compared with the stoichiometry VO$_2$ films. The experimental evidence is presented and the cause for nonstoichiometry dependence of Raman spectra of VO$_2$ films is discussed.
Keywords:  vanadium dioxide thin films      Raman spectra      nonstoichiometry      RF magnetron sputtering  
Received:  04 June 2003      Revised:  11 September 2003      Accepted manuscript online: 
PACS:  78.66.Li (Other semiconductors)  
  78.30.Hv (Other nonmetallic inorganics)  
  68.55.Nq (Composition and phase identification)  
Fund: Project supported by the National Natural Science Foundation of China (Grant No 50072045), and the Foundation of Center for Condensed Matter Physics.

Cite this article: 

Yuan Hong-Tao (袁宏韬), Feng Ke-Cheng (冯克成), Wang Xue-Jin (王学进), Li Chao (李超), He Chen-Juan (何琛娟), Nie Yu-Xin (聂玉昕) Effect of nonstoichiometry on Raman scattering of VO2 films 2004 Chinese Physics 13 82

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