Effect of deposition parameters on structural and mechanicalproperties of niobium nitride synthesized by plasma focus device

doi:10.1088/1674-1056/24/6/065204

Abstract Effects of deposition angle and axial distance on the structural and mechanical properties of niobium nitride synthesized by a dense plasma focus (DPF) system are studied. The x-ray diffraction (XRD) confirms that the deposition parameters affect the growth of multi-phase niobium nitride. Scanning electron microscopy (SEM) shows the granular surface morphology with strong thermally assisted coagulation effects observed at the 5-cm axial distance. The non-porous granular morphology observed at the 9-cm distance along the anode axis is different from those observed at deposition angles of 10° and 20°. Energy dispersive x-ray (EDX) spectroscopy reveals the maximum nitrogen content at the shortest (5 cm) axial position. Atomic force microscopy (AFM) exhibits that the roughness of coated films varies for coatings synthesized at different axial and angular positions, and the Vickers micro-hardness test shows that a maximum hardness value is (08.44± 0.01) GPa for niobium nitride synthesized at 5-cm axial distance, which is about 500% more than that of a virgin sample.

Keywords: DPF device niobium nitride XRD SEM AFM micro-hardness

Received: 19 September 2014
Revised: 15 January 2015
Accepted manuscript online:

PACS:	52.59.Hq	(Dense plasma focus)
	52.77.Dq	(Plasma-based ion implantation and deposition)
	61.05.cp	(X-ray diffraction)
	62.20.Qp	(Friction, tribology, and hardness)

Fund: Project supported by the HEC, Pakistan.

Corresponding Authors: Tousif Hussain
E-mail: tousifhussain@gcu.edu.pk

About author: 52.59.Hq; 52.77.Dq; 61.05.cp; 62.20.Qp

Cite this article:

Jamil Siddiqui, Tousif Hussain, Riaz Ahmad, Nida Khalid Effect of deposition parameters on structural and mechanicalproperties of niobium nitride synthesized by plasma focus device 2015 Chin. Phys. B 24 065204

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Effect of deposition parameters on structural and mechanicalproperties of niobium nitride synthesized by plasma focus device

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