Amorphous Er2O3 films for antireflection coatings

doi:10.1088/1674-1056/19/9/097807

Abstract This paper reports that stoichiometric, amorphous, and uniform Er₂O₃ films are deposited on Si(001) substrates by a radio frequency magnetron sputtering technique. Ellipsometry measurements show that the refractive index of the Er₂O₃ films is very close to that of a single layer antireflection coating for a solar cell with an air surrounding medium during its working wavelength. For the 90-nm-thick film, the reflectance has a minimum lower than 3% at the wavelength of 600 nm and the weighted average reflectances (400–1000 nm) is 11.6%. The obtained characteristics indicate that Er₂O₃ films could be a promising candidate for antireflection coatings in solar cells.

Keywords: Er₂O₃ film optical constants insulators solar power

Received: 03 November 2009
Revised: 25 February 2010
Accepted manuscript online:

PACS:	7865
	7850E
	7820D
	7755

Fund: Project supported by the Special Project of Shanghai Nano-technology (Grant No. 0852nm02400), the National Natural Science Foundation of China (Grant Nos. 10804072 and 60806031), and the Key Fundamental Project of Shanghai (Grant No. 08JC1410400).

Cite this article:

Zhu Yan-Yan(朱燕艳), Fang Ze-Bo(方泽波), and Liu Yong-Sheng(刘永生) Amorphous Er₂O₃ films for antireflection coatings 2010 Chin. Phys. B 19 097807

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Amorphous Er₂O₃ films for antireflection coatings