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Acta Physica Sinica (Overseas Edition), 1995, Vol. 4(11): 859-863    DOI: 10.1088/1004-423X/4/11/010
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PASSIVATION OF THE InP(100) SURFACE USING (NH4)2Sx

CHEN WEI-DE (陈维德), XIE KAN (谢侃), DUAN LI-HONG (段俐宏), XIE XIAO-LONG (谢小龙), CUI YU-DE (崔玉德)
Institute of Semiconductors, and State Key Laboratory far Surface Physics, Academia Sinica, Beijing 100083, China
Abstract  InP(100) surface treated with (NH4)2Sx has been investigated by using photolumines-cence(PL), Auger electron spectroscopy and X-ray photoelectron spectroscopy, It is found that PL intensity increased by a factor of 3.3 after (NH4)2Sx passivation and the sulfur remained on the surface only bonded to indium, not to phosphorus. This suggests that the sulfur atoms replace the phosphorus atoms on the surface and occupy the phosphorus vacancies.
Received:  06 January 1995      Accepted manuscript online: 
PACS:  81.65.Rv (Passivation)  
  68.47.Fg (Semiconductor surfaces)  
  78.55.Cr (III-V semiconductors)  
  79.60.Bm (Clean metal, semiconductor, and insulator surfaces)  
  68.35.Dv (Composition, segregation; defects and impurities)  
Fund: project supported by the National Natural Science Foundation of China.

Cite this article: 

CHEN WEI-DE (陈维德), XIE KAN (谢侃), DUAN LI-HONG (段俐宏), XIE XIAO-LONG (谢小龙), CUI YU-DE (崔玉德) PASSIVATION OF THE InP(100) SURFACE USING (NH4)2Sx 1995 Acta Physica Sinica (Overseas Edition) 4 859

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