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First-principles calculations of F-, Cl-, and N-related defects of amorphous SiO 2 and their impacts on carrier trapping and proton release |
| Xin Gao(高鑫)1, Yunliang Yue(乐云亮)2, Yang Liu(刘杨)3,4, and Xu Zuo(左旭)1,5,6,† |
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1 College of Electronic Information and Optical Engineering, Nankai University, Tianjin 300071, China;
2 School of Information Engineering, Yangzhou University, Yangzhou 225127, China;
3 Microsystem and Terahertz Research Center, China Academy of Engineering Physics, Chengdu 610200, China;
4 Institute of Electronic Engineering, China Academy of Engineering Physics, Mianyang 621999, China;
5 Municipal Key Laboratory of Photo-electronic Thin Film Devices and Technology, Nankai University, Tianjin 300071, China;
6 Engineering Research Center of Thin Film Optoelectronics Technology, Ministry of Education, Tianjin 300071, China
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Abstract The first-principles calculations based on density functional theory are performed to study F-, Cl-, and N-related defects of amorphous SiO2 (a-SiO2) and their impacts on carrier trapping and proton release. The possible geometric configurations of the impurity-related defects, the formation energies, the hole or electron trapping of the neutral defects, and the mechanisms to suppress proton diffusion by doping N are investigated. It is demonstrated by the calculations that the impurity atoms can interact with the oxygen vacancies and result in impurity-related defects. The reactions can be utilized to saturate oxygen vacancies that will cause ionization damage to the semiconducting devices. Moreover, the calculated formation energy indicates that the F-or Cl-related oxygen vacancy defect is a deep hole trap, which can trap holes and prevent them from diffusing to the a-SiO2/Si interface. However, three N-related defects, namely N(2)o-H, N(2)o=O, and N(3)o-V o, tend to act as shallow hole traps to facilitate hole transportation during device operation. The N(2)o and N(3)o configurations can be negatively charged as deep electron traps during the oxide charge buildup after ionization radiation. In addition, the nudged elastic band (NEB) calculations show that four N-related defects, namely N(2)o, N(2)o-H, N(2)o=O, and N(3)o are capable of capturing protons and preventing them from diffusing to and de-passivating the interface. This research reveals the fundamental properties of the F-, Cl-, and N-related defects in amorphous silica and the details of the reactions of the carrier trapping and proton release. The findings help to understand the microscopic mechanisms that alleviate ionization damage of semiconducting devices by doping a-SiO2.
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Received: 30 December 2020
Revised: 03 February 2021
Accepted manuscript online: 08 February 2021
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PACS:
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71.15.Mb
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(Density functional theory, local density approximation, gradient and other corrections)
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71.20.-b
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(Electron density of states and band structure of crystalline solids)
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61.72.Bb
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(Theories and models of crystal defects)
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61.80.Az
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(Theory and models of radiation effects)
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| Fund: Project supported by the Science Challenge Project (Grant No. TZ2016003-1-105), CAEP Microsystem and THz Science and Technology Foundation (Grant No. CAEPMT201501), the National Basic Research Program of China (Grant No. 2011CB606405), and Tianjin Natural Science Foundation, China (Grant No. 20JCZDJC00750). |
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Corresponding Authors:
†Corresponding author. E-mail: xzuo@nankai.edu.cn
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Cite this article:
Xin Gao(高鑫), Yunliang Yue(乐云亮), Yang Liu(刘杨), and Xu Zuo(左旭) First-principles calculations of F-, Cl-, and N-related defects of amorphous SiO 2 and their impacts on carrier trapping and proton release 2021 Chin. Phys. B 30 047104
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