| INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY |
Prev
Next
|
|
|
Comparative study of high temperature anti-oxidation property of sputtering deposited stoichiometric and Si-rich SiC films |
| Hang-Hang Wang(王行行), Wen-Qi Lu(陆文琪), Jiao Zhang(张娇), and Jun Xu(徐军)† |
| Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Ministry of Education, School of Physics, Dalian University of Technology, Dalian 116024, China |
|
|
|
|
Abstract Stoichiometric and silicon-rich (Si-rich) SiC films were deposited by microwave electron cyclotron resonance (MW-ECR) plasma enhanced RF magnetron sputtering method. As-deposited films were oxidized at 800 ℃, 900 ℃, and 1000 ℃ in air for 60 min. The chemical composition and structure of the films were analyzed by x-ray photoelectron spectroscopy (XPS), Raman spectroscopy and Fourier transform infrared spectroscopy (FT-IR). The surface morphology of the films before and after the high temperature oxidation was measured by atomic force microscopy. The mechanical property of the films was measured by a nano-indenter. The anti-oxidation temperature of the Si-rich SiC film is 100 ℃ higher than that of the stoichiometric SiC film. The oxidation layer thickness of the Si-rich SiC film is thinner than that of the stoichiometric SiC film in depth direction. The large amount of extra silicon in the Si-rich SiC film plays an important role in the improvement of its high temperature anti-oxidation property.
|
Received: 17 September 2021
Revised: 31 October 2021
Accepted manuscript online: 17 November 2021
|
|
PACS:
|
81.15.Cd
|
(Deposition by sputtering)
|
| |
68.60.Dv
|
(Thermal stability; thermal effects)
|
|
Corresponding Authors:
Jun Xu
E-mail: xujun@dlut.edu.cn
|
Cite this article:
Hang-Hang Wang(王行行), Wen-Qi Lu(陆文琪), Jiao Zhang(张娇), and Jun Xu(徐军) Comparative study of high temperature anti-oxidation property of sputtering deposited stoichiometric and Si-rich SiC films 2022 Chin. Phys. B 31 048103
|
[1] Xu M, Girish Y R, Rakesh K P, Wu P, Manukumar H M, Byrappa S M, Udayabhanu and Byrappa K 2021 Mater. Today Commun. 28 102533
[2] Liu P, Hao J L, Wang S K, You N N, Hu Q Y, Zhang Q, Bai Y and Liu X Y 2021 Chin. Phys. B 30 077303
[3] He R, Zhou N, Zhang K, Zhang X, Zhang L, Wang W and Fang D 2021 J. Adv. Ceram. 10 637
[4] Ning K and Lu K 2018 J. Am. Ceram. Soc. 101 3662
[5] Huang L, Zhu J, Ma Y, Liang T, Lei C, Li Y and Gu X 2021 Acta Phys. Sin. 70 207302 (in Chinese)
[6] Liu H, Li J and Li B 2018 Chin. Phys. Lett. 35 096103
[7] Xu Y, Diao H, Zhang S, Li X, Zeng X, Wang W and Liao X 2007 Acta Phys. Sin. 56 2915 (in Chinese)
[8] Bu A, Zhang Y, Zhang Y, Chen W, Cheng H, Wang L and Wang Y 2018 Coatings 8 344
[9] Qiang X, Li H, Zhang N, Liu Y and Tian S 2018 Int. J. Appl. Ceram. Technol. 15 1100
[10] Arce R, Koropecki R R, Buitrago R H, Alvarez F and Chambouleyron I 1989 J. Appl. Phys. 66 4544
[11] Choi W K, Lee L P, Foo S L, Gangadharan S, Chong N B anf Tan L S 2001 J. Appl. Phys. 89 1942
[12] Vasin A V, Muto S, Ishikawa Y, Rusavsky A V, Kimura T, Lysenko V S and Nazarov A N 2011 Thin Solid Films 519 2218
[13] Jiang Y, Ru H, Ye C, Wang W, Zhang C and Su X 2018 Ceram. Int. 44 17369
[14] Wang H, Zhang L, Lu W and Xu J 2020 Plasma Sci. Technol. 22 034010
[15] Zhang Z, Liu T, Xu J, Deng X and Dong C 2006 Surf. Coat. Technol. 200 4918
[16] Xu J, Deng X, Zhang J, Lu W and Ma T 2001 Thin Solid Films 390 107
[17] Choi W K, Ong T Y, Tan L S, Loh F C and Tan K L 1998 J. Appl. Phys. 83 4968
[18] Lin H, Gerbec J A, Sushchikh M and Mcfarland E W 2008 Nanotechnology 19 325601
[19] Cheng C H, Wu C L, Lin Y H, Yan W L, Shih M H, Chang J H, Wu C I, Lee C K and Lin G R 2015 J. Mater. Chem. C 3 10164
[20] Masuda T, Iwasaka A, Takagishi H and Shimoda T 2016 J. Am. Ceram. Soc. 99 1651
[21] Kamble M, Waman V, Mayabadi A, Funde A, Sathe V, Shripathi T, Pathan H and Jadkar S 2017 Silicon 9 421
[22] Khatami Z, Wilson P R J, Wojcik J and Mascher P 2017 Thin Solid Films 622 1
[23] Ramos-Serrano J R, Matsumoto Y, Méndez-Blas A, Dutt A, Morales C and Oliva A I 2019 J. Alloys Compd. 780 341
[24] Awad Y, Khakani M A EI, Aktik C, Mouine J, Camiré N, Lessard M, Scarlete M, Al-Abadleh H A and Smirani R 2009 Surf. Coat. Technol. 204 539
[25] Wang L 2011 J. Non-Cryst. Solids 357 1063
[26] Jedrzejowski P, Cizek J, Amassian A, Klemberg-Sapieha J E, Vlcek J and Martinu L 2004 Thin Solid Films 447 201
[27] Khalfi A EI, Ech-chamikh E, Ijdiyaou Y, Azizan M, Essafti A, Nkhaili L, El Kissani A and Tomasella E 2017 Vib. Spectrosc. 89 44
[28] Opila E J 1994 J. Am. Ceram. Soc. 77 730
[29] Pöhlmann K, Bhushan B and Gahr K H Z 2000 Wear 237 116
[30] Khakani M E, Chaker M, O'Hern M E and Oliver W C 1997 J. Appl. Phys. 82 4310
[31] Saha R, Xue Z, Huang Y and Nix W D 2001 J. Mech. Phys. Solids 49 1997 |
| No Suggested Reading articles found! |
|
|
Viewed |
|
|
|
Full text
|
|
|
|
|
Abstract
|
|
|
|
|
Cited |
|
|
|
|
Altmetric
|
|
blogs
Facebook pages
Wikipedia page
Google+ users
|
Online attention
Altmetric calculates a score based on the online attention an article receives. Each coloured thread in the circle represents a different type of online attention. The number in the centre is the Altmetric score. Social media and mainstream news media are the main sources that calculate the score. Reference managers such as Mendeley are also tracked but do not contribute to the score. Older articles often score higher because they have had more time to get noticed. To account for this, Altmetric has included the context data for other articles of a similar age.
View more on Altmetrics
|
|
|
