Chin. Phys. B
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Chin. Phys. B  2017, Vol. 26 Issue (4): 045201    DOI: 10.1088/1674-1056/26/4/045201
PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES Current Issue| Next Issue| Archive| Adv Search |
Variation of passivation behavior induced by sputtered energetic particles and thermal annealing for ITO/SiOx/Si system
Ming Gao(高明)1, Hui-Wei Du(杜汇伟)1, Jie Yang(杨洁)1, Lei Zhao(赵磊)1, Jing Xu(徐静)2, Zhong-Quan Ma(马忠权)1,2
1 SHU-SOEN's Research and Development Laboratory, Department of Physics, Shanghai University, Shanghai 200444, China;
2 Instrumental Analysis and Research Center, Shanghai University, Shanghai 200444, China

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