Enhanced surface plasmon interference lithography from cavity resonance in the grating slits

doi:10.1088/1674-1056/24/4/047301

Abstract Surface plasmon interference lithography based on grating diffraction has been studied both theoretically and experimentally in recent years. In this paper, we demonstrate that the cavity resonance in the grating slits can improve the subwavelength interference, not only the intensity but also the uniformity of the pattern. Both the typical lithography structure which merely consists of periodic metallic gratings and the modified structure equipped with a reflection layer are studied. The finite element method has been performed to study the interference pattern. Numerical simulations show that the property of the interference pattern is the optimum when cavity resonance happens. This enhancement can be applied to all the lithography structures which are based on the grating diffraction.

Keywords: surface plasmons lithography cavity resonance

Received: 03 October 2014
Revised: 14 November 2014
Accepted manuscript online:

PACS:	73.20.Mf	(Collective excitations (including excitons, polarons, plasmons and other charge-density excitations))
	42.25.Hz	(Interference)
	42.82.Cr	(Fabrication techniques; lithography, pattern transfer)

Fund: Project supported by the National Basic Research Program of China (Grant No. 2013CBA01702) and the National Natural Science Foundation of China (Grant Nos. 61377016, 61308017, and 61307072).

Corresponding Authors: Liu Shu-Tian
E-mail: stliu@hit.edu.cn

Cite this article:

Guo Kai (郭凯), Liu Jian-Long (刘建龙), Zhou Ke-Ya (周可雅), Liu Shu-Tian (刘树田) Enhanced surface plasmon interference lithography from cavity resonance in the grating slits 2015 Chin. Phys. B 24 047301

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Enhanced surface plasmon interference lithography from cavity resonance in the grating slits

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