Effect of trace oxygen on plasma nitriding of titanium foil

doi:10.1088/1674-1056/ad35b0

Abstract Titanium nitride films are prepared by plasma enhanced chemical vapor deposition method on titanium foil using N$_{2}$ as precursor. In order to evaluate the effect of oxygen on the growth of titanium nitride films, a small amount of O$_{2}$ is introduced into the preparation process. The study indicates that trace O$_{2}$ addition into the reaction chamber gives rise to significant changes on the color and micro-morphology of the foil, featuring dense and long nano-wires. The as-synthesized nanostructures are characterized by various methods and identified as TiN, Ti$_{2}$N, and TiO$_{2}$ respectively. Moreover, the experiment results show that oxide nanowire has a high degree of crystallinity and the nitrides present specific orientation relationships with the titanium matrix.

Keywords: nitride oxide nanostructure crystalline plasma-enhanced chemical vapor deposition system (PECVD)

Received: 18 January 2024
Revised: 05 March 2024
Accepted manuscript online: 20 March 2024

PACS:	81.15.Gh	(Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))
	61.46.Km	(Structure of nanowires and nanorods (long, free or loosely attached, quantum wires and quantum rods, but not gate-isolated embedded quantum wires))
	61.46.Df	(Structure of nanocrystals and nanoparticles ("colloidal" quantum dots but not gate-isolated embedded quantum dots))

Fund: Project supported by the Innovation Funding of Beijing Institute of Aeronautical Materials.

Corresponding Authors: Cheng-Min Shen
E-mail: cmshen@iphy.ac.cn

Cite this article:

Hai-Tao Zhou(周海涛), Xi-Ya Xiong(熊希雅), Ke-Xin Ma(马可欣), Bing-Wei Luo(罗炳威), Fei Luo(罗飞), and Cheng-Min Shen(申承民) Effect of trace oxygen on plasma nitriding of titanium foil 2024 Chin. Phys. B 33 068103

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Effect of trace oxygen on plasma nitriding of titanium foil

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