Please wait a minute...
Chin. Phys. B, 2021, Vol. 30(5): 050703    DOI: 10.1088/1674-1056/abcfa2
GENERAL Prev   Next  

Characterization and application in XRF of HfO2-coated glass monocapillary based on atomic layer deposition

Yan-Li Li(李艳丽)1†, Ya-Bing Wang(王亚冰)2,†, Wei-Er Lu(卢维尔)3, Xiang-Dong Kong(孔祥东)1,4,‡, Li Han(韩立)1,4, and Hui-Bin Zhao(赵慧斌)1
1 Institute of Electrical Engineering, Chinese Academy of Sciences, Beijing 100190, China;
2 College of Nuclear Science and Technology, Beijing Normal University, Beijing 100875, China;
3 Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China;
4 University of Chinese Academy of Sciences, Beijing 100049, China
Abstract  Coating a glass monocapillary x-ray optics with high-density film is a promising way to improve transmission characteristics. For a long time, it has been a challenge to coat a high-density film in the inside of monocapillary with an extremely high length-to-diameter ratio. In this work, HfO$_{2}$ film is deposited on the inner wall of a tapered glass monocapillary with length 9.9 cm, entrance diameter 596.4 μm, and exit diameter 402.3 μm by atomic layer deposition. The coated and uncoated monocapillaries are studied by the transmission process of x-rays with energy from 5 keV to 100 keV and the x-ray fluorescence (XRF) spectra of a Mo sample are detected. Improved transmission characteristics have been obtained for the HfO$_{2}$-coated monocapillary. The energy upper limit of focused x-rays increases from 18.1 keV to 33.0 keV and the ‘penetration halo’ is suppressed to some extent. The XRF spectrum presents two stronger peaks at $\sim 17.4$ keV and $\sim 19.6$ keV which are considered as the characteristic x-rays of Mo K$_{\alpha }$ and Mo K$_{\beta }$. These results reveal that more higher energy x-rays from the W x-ray tube are totally reflected on the inner wall of the HfO$_{2}$-coated glass monocapillary due to the increase of total reflection critical angle. This work is significant for more applications of monocapillary in higher energy x-ray field.
Keywords:  x-ray optics      monocapillary      atomic layer deposition      HfO2 film  
Received:  23 September 2020      Revised:  04 November 2020      Accepted manuscript online:  02 December 2020
PACS:  07.85.-m (X- and γ-ray instruments)  
  41.50.+h (X-ray beams and x-ray optics)  
Fund: Project supported by the National Key Research and Development Program of China (Grant No. 2018YFF0109100), Fund from the Institute of Electrical Engineering, Chinese Academy of Sciences (Grant No. E1554404), and the National Natural Science Foundation of China (Grant Nos. 11675019 and 11875087).
Corresponding Authors:  Xiang-Dong Kong     E-mail:  slkongxd@mail.iee.ac.cn

Cite this article: 

Yan-Li Li(李艳丽), Ya-Bing Wang(王亚冰), Wei-Er Lu(卢维尔), Xiang-Dong Kong(孔祥东), Li Han(韩立), and Hui-Bin Zhao(赵慧斌) Characterization and application in XRF of HfO2-coated glass monocapillary based on atomic layer deposition 2021 Chin. Phys. B 30 050703

[1] Erko A, Idir M, Krist T and Michette A G 2008 Modern Developments in X-Ray and Neutron Optics (Berlin: Springer-Verlag) p. 288
[2] Matsuura Y, Oyama T and Miyagi M 2005 Proc. SPIE 5691 9
[3] Mroczka R, Zukocinski G and Kuczumow A 2004 J. Alloys Compd. 382 311
[4] Wang Y B, Zhang X Y, Li Y F, Sun X P, Shao S K, Liu Z G and Sun T X 2019 Nucl. Instrum. Method A 934 36
[5] Chen B Z and Yan Y M 1999 Chin. Phys. Lett. 16 630
[6] Zhu Y, Wang Y B, Sun T X, Sun X P, Zhang X Y, Liu Z G, Li Y F and Zhang F Z 2018 Appl. Radiat. Isotopes 137 172
[7] Yang J, Li Y D, Wang X Y, Zhang X Y and Lin X Y 2017 Nucl. Instrum. Method B 401 25
[8] Jiang B W, Liu Z G, Sun X P, Sun T X, Deng B, Li F Z, Yi L T, Yuan M N, Zhu Y, Zhang F S, Xiao T Q, Wang J and Tai R Z 2017 Opt. Commun. 398 91
[9] Wang Y D, Ren Y Q, Sun T X, Tao F, Deng B and Xiao T Q 2018 Microsc. Microanal. 24 (Suppl 2) 282
[10] Hirsch G 2003 X-ray Spectrom. 32 229
[11] Li Y D, Lin X Y, Tan Z Y, Sun T X and Liu Z G 2011 Chin. Phys. B 20 040702
[12] Lin X Y, Wang Z H, Chu X L, Sun T X and Ding X L 2007 Chin. Phys. Lett. 24 3368
[13] Hirsch G 2004 Synchrotron Radiation Instrumentation: Eighth International Conference p. 728
[14] Mroczka R, Zukocinski G and Kuczumow A 2005 J. Alloys Compd. 401 108
[15] Mroczka R, Bartosik P, Sawlowicz Z, Skrzypiec K, Falkenberg G, Wójcik J, Żukociński G and Kuczumow A 2008 Thin Solid Films 516 8029
[16] Matsuura Y, Oyama T and Miyagi M 2005 Appl. Opt. 44 6193
[17] Nakazawa T and Nakano K 2011 Powder Diffr. 26 163
[18] Gakis G P, Vahlas C, Vergnes H, Dourdain S, Tison Y, Martinez H, Bour J, Ruch D, Boudouvis A G, Caussat B and Scheid E 2019 Appl. Surf. Sci. 492 245
[19] Gougam A B, Rajab B and Afif A B 2019 Mat. Sci. Semicond. Proc. 95 42
[20] Graniel O, Fedorenko V, Viter R, Iatsunskyi I, Nowaczyk G, Weber M, Zalȩski K, Jurga S, Smyntyna V, Miele P, Ramanavicius A, Balme S and Bechelany M 2018 Mat. Sci. Eng. B 236-237 139
[21] Mayer M, Grevent C, Szeghalmi A, Knez M, Weigand M, Rehbein S, Schneider G, Baretzky B and Schutz G 2011 Ultramicroscopy 111 1706
[22] Sanli U T, Jiao C, Baluktsian M, Grévent C, Hahn K, Wang Y, Srot V, Richter G, Bykova I, Weigand M, Schütz G and Keskinbora K 2018 Adv. Sci. 1800346 1
[23] Wang Y B, Li Y L, Shao S K, Zhang X Y, Li Y F, Sun X P, Tao F, Deng B and Sun T X 2020 Opt. Commun. 464 125544
[24] Sun T X and Ding X L 2004 Nucl. Instrum. Method B 226 651
[25] Luo L Q, Zhan X C and Li G H 2015 X-ray Fluorescence Spectrometry (Beijing: Beijing Chemical Industry Press) p. 271 (in Chinese)
[1] Physical analysis of normally-off ALD Al2O3/GaN MOSFET with different substrates using self-terminating thermal oxidation-assisted wet etching technique
Cheng-Yu Huang(黄成玉), Jin-Yan Wang(王金延), Bin Zhang(张斌), Zhen Fu(付振), Fang Liu(刘芳), Mao-Jun Wang(王茂俊), Meng-Jun Li(李梦军), Xin Wang(王鑫), Chen Wang(汪晨), Jia-Yin He(何佳音), and Yan-Dong He(何燕冬). Chin. Phys. B, 2022, 31(9): 097401.
[2] Designing high k dielectric films with LiPON—Al2O3 hybrid structure by atomic layer deposition
Ze Feng(冯泽), Yitong Wang(王一同), Jilong Hao(郝继龙), Meiyi Jing(井美艺), Feng Lu(卢峰), Weihua Wang(王维华), Yahui Cheng(程雅慧), Shengkai Wang(王盛凯), Hui Liu(刘晖), and Hong Dong(董红). Chin. Phys. B, 2022, 31(5): 057701.
[3] X-ray focusing using an x-ray lens composed of multi-square polycapillary slices
Kai Pan(潘凯), Tian-Cheng Yi(易天成), Zhao Wang(王瞾), Mo Zhou(周末), Yu-De Li(李玉德), Zhi-Guo Liu(刘志国), Xiao-Yan Lin(林晓燕), and Tian-Xi Sun(孙天希). Chin. Phys. B, 2022, 31(2): 020701.
[4] Uniform light emission from electrically driven plasmonic grating using multilayer tunneling barriers
Xiao-Bo He(何小波), Hua-Tian Hu(胡华天), Ji-Bo Tang(唐继博), Guo-Zhen Zhang(张国桢), Xue Chen(陈雪), Jun-Jun Shi(石俊俊), Zhen-Wei Ou(欧振伟), Zhi-Feng Shi(史志锋), Shun-Ping Zhang(张顺平), Chang Liu(刘昌), and Hong-Xing Xu(徐红星). Chin. Phys. B, 2022, 31(1): 017803.
[5] Low-temperature plasma enhanced atomic layer deposition of large area HfS2 nanocrystal thin films
Ailing Chang(常爱玲), Yichen Mao(毛亦琛), Zhiwei Huang(黄志伟), Haiyang Hong(洪海洋), Jianfang Xu(徐剑芳), Wei Huang(黄巍), Songyan Chen(陈松岩), Cheng Li(李成). Chin. Phys. B, 2020, 29(3): 038102.
[6] Surface termination effects on the electrical characteristics of La2O3/Al2O3 nanolaminates deposited by atomic layer deposition
Ji-Bin Fan(樊继斌), Shan-Ya Ling(凌山雅), Hong-Xia Liu(刘红侠), Li Duan(段理), Yan Zhang(张研), Ting-Ting Guo(郭婷婷), Xing Wei(魏星), and Qing He(何清)$. Chin. Phys. B, 2020, 29(11): 117701.
[7] Effect of source temperature on phase and metal–insulator transition temperature of vanadium oxide films grown by atomic layer deposition
Bingheng Meng(孟兵恒), Dengkui Wang(王登魁)†, Deshuang Guo(郭德双), Juncheng Liu(刘俊成), Xuan Fang(方铉), Jilong Tang(唐吉龙), Fengyuan Lin(林逢源), Xinwei Wang(王新伟), Dan Fang(房丹), and Zhipeng Wei(魏志鹏)‡. Chin. Phys. B, 2020, 29(10): 107102.
[8] Crystalline silicon surface passivation investigated by thermal atomic-layer-deposited aluminum oxide
Cai-Xia Hou(侯彩霞), Xin-He Zheng(郑新和), Rui Jia(贾锐), Ke Tao(陶科), San-Jie Liu(刘三姐), Shuai Jiang(姜帅), Peng-Fei Zhang(张鹏飞), Heng-Chao Sun(孙恒超), Yong-Tao Li(李永涛). Chin. Phys. B, 2017, 26(9): 098103.
[9] Influences of different oxidants on characteristics of La2O3/Al2O3 nanolaminates deposited by atomic layer deposition
Ji-Bin Fan(樊继斌), Hong-Xia Liu(刘红侠), Li Duan(段理), Yan Zhang(张研), Xiao-Chen Yu(于晓晨). Chin. Phys. B, 2017, 26(6): 067701.
[10] Performance and reliability improvement of La2O3/Al2O3 nanolaminates using ultraviolet ozone post treatment
Ji-Bin Fan(樊继斌), Hong-Xia Liu(刘红侠), Bin Sun(孙斌), Li Duan(段理), Xiao-Chen Yu(于晓晨). Chin. Phys. B, 2017, 26(5): 057702.
[11] Influences of different structures on the characteristics of H2O-based and O3-based LaxAlyO films deposited by atomic layer deposition
Chen-Xi Fei(费晨曦), Hong-Xia Liu(刘红侠), Xing Wang(汪星), Dong-Dong Zhao(赵冬冬), Shu-Long Wang(王树龙), Shu-Peng Chen(陈树鹏). Chin. Phys. B, 2016, 25(5): 058106.
[12] Growth mechanism of atomic-layer-deposited TiAlC metal gatebased on TiCl4 and TMA precursors
Jinjuan Xiang(项金娟), Yuqiang Ding(丁玉强), Liyong Du(杜立永), Junfeng Li(李俊峰),Wenwu Wang(王文武), Chao Zhao(赵超). Chin. Phys. B, 2016, 25(3): 037308.
[13] Property of slice square polycapillary x-ray optics
Shi-Qi Peng(彭诗棋), Zhi-Guo Liu(刘志国), Tian-Xi Sun(孙天希), Kai Wang(王锴), Long-Tao Yi(易龙涛), Kui Yang(杨魁), Man Chen(陈曼), Jin-Bang Wang(王金榜). Chin. Phys. B, 2016, 25(2): 024102.
[14] Influences of annealing on structural and compositional properties of Al2O3 thin films grown on 4H-SiC by atomic layer deposition
Li-Xin Tian(田丽欣), Feng Zhang(张峰), Zhan-Wei Shen(申占伟), Guo-Guo Yan(闫果果), Xing-Fang Liu(刘兴昉), Wan-Shun Zhao(赵万顺), Lei Wang(王雷), Guo-Sheng Sun(孙国胜), Yi-Ping Zeng(曾一平). Chin. Phys. B, 2016, 25(12): 128104.
[15] Charge transport and bipolar switching mechanismin a Cu/HfO2/Pt resistive switching cell
Tingting Tan(谭婷婷), Tingting Guo(郭婷婷), Zhihui Wu(吴志会), Zhengtang Liu(刘正堂). Chin. Phys. B, 2016, 25(11): 117306.
No Suggested Reading articles found!