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Special Issue:
TOPICAL REVIEW — Nanophotonics
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Etching-assisted femtosecond laser microfabrication |
| Monan Liu(刘墨南)1, Mu-Tian Li(李木天)2, Han Yang(杨罕)2, Hong-Bo Sun(孙洪波)2 |
1 Department of Condensed Matter, College of Physics, Jilin University, Changchun 130012, China;
2 State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun 130012, China |
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Abstract Although femtosecond laser microfabrication is one of the most promising three-dimensional (3D) fabrication techniques, it could suffer from low fabrication efficiency for structures with high 3D complexities. By using etching as a main assistant technique, the processing can be speeded up and an improved structure surface quality can be provided. However, the assistance of a single technique cannot satisfy the increasing demands of fabrication and integration of highly functional 3D microstructures. Therefore, a multi-technique-based 3D microfabrication method is required. In this paper, we briefly review the recent development on etching-assisted femtosecond laser microfabrication (EAFLM). Various processing approaches have been proposed to further strengthen the flexibilities of the EAFLM. With the use of the multi-technique-based microfabrication method, 3D microstructure arrays can be rapidly defined on planar or curved surfaces with high structure qualities.
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Received: 13 April 2018
Revised: 23 May 2018
Accepted manuscript online:
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PACS:
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42.65.Re
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(Ultrafast processes; optical pulse generation and pulse compression)
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42.30.-d
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(Imaging and optical processing)
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| Fund: Project supported by the National Natural Science Foundation of China (Grant No. 51501070). |
Corresponding Authors:
Han Yang
E-mail: yanghan@jlu.edu.cn
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Cite this article:
Monan Liu(刘墨南), Mu-Tian Li(李木天), Han Yang(杨罕), Hong-Bo Sun(孙洪波) Etching-assisted femtosecond laser microfabrication 2018 Chin. Phys. B 27 094212
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