PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES |
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Spatial variation behaviors of argon inductively coupled plasma during discharge mode transition |
Gao Fei(高飞)a), Li Xue-Chun(李雪春)a), Zhao Shu-Xia(赵书霞)b), and Wang You-Nian(王友年)a)† |
a School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China; b Research Group PLASMANT, Department of Chemistry, University of Antwerp, Universiteitsplein 1, B-2610 Antwerp, Belgium |
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Abstract A Langmuir probe and an ICCD are employed to study the discharge mode transition in an Ar inductively coupled plasma. Electron density and plasma emission intensity are measured during the E (capacitive discharge) to H (inductive discharge) mode transitions at different pressures. It is found that plasma exists with a low electron density and a weak emission intensity in the E mode, while it has a high electron density and a strong emission intensity in the H mode. Meanwhile, the plasma emission intensity spatial (2D image) profile is symmetrical in the H mode, but the 2D image is an asymmetric profile in the E mode. Moreover, the electron density and emission intensity jump up discontinuously at high pressure, but increase almost continuously at the E to H mode transition under low pressure.
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Received: 27 September 2011
Revised: 04 November 2011
Accepted manuscript online:
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PACS:
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52.70.-m
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(Plasma diagnostic techniques and instrumentation)
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52.80.Pi
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(High-frequency and RF discharges)
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52.50.Qt
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(Plasma heating by radio-frequency fields; ICR, ICP, helicons)
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Fund: Project supported by the National Natural Science Foundation of China (Grant Nos. 11075029 and 11175034), the Specialized Research Fund for the Doctoral Program of Higher Education of China (Grant No. 20090041110026), and the Fundamental Research Funds for Central Universities of China(Grant No. DUT11ZD109). |
Corresponding Authors:
Wang You-Nian
E-mail: ynwang@dlut.edu.cn
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Cite this article:
Gao Fei(高飞), Li Xue-Chun(李雪春), Zhao Shu-Xia(赵书霞), and Wang You-Nian(王友年) Spatial variation behaviors of argon inductively coupled plasma during discharge mode transition 2012 Chin. Phys. B 21 075203
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