a Key Laboratory in University for Radiation Beam Technology and Materials Modification, Beijing Normal University; Institute of Low Energy Nuclear Physics, Beijing Normal University; Beijing Radiation Center; Beijing 100875, China; b Department of Materials Science and Engineering, Nanchang University, Nanchang 330047, China; c Department of Chemistry, Peking University, Beijing 100871, China; d Surface Physics Laboratory, Fudan University, Shanghai 200433, China
Abstract Erbium-doped silicon has been fabricated by ion implantation performed on a metal vapour vacuum arc ion source. After rapid thermal annealing (RTA), 1.54μm photoluminescence was observed at 77K. Rutherford backscattering spectrum indicated that Er ions are mainly distributed near the surface of the samples, and Er concentration exceeded 1021cm-3. Needle nanometre crystalline silicon (nc-Si) was formed on the substrate surface. Band edge emission spectrum at 10K verified that the minority carrier lifetime increased upon RTA. The photocarrier mediated processes enabled energy transferring from nc-Si (or c-Si) to the Er3+ ions and resulted in light emission of 1.54μm.
Received: 18 January 2001
Revised: 16 December 2000
Accepted manuscript online:
Altmetric calculates a score based on the online attention an article receives. Each coloured thread in the circle represents a different type of online attention. The number in the centre is the Altmetric score. Social media and mainstream news media are the main sources that calculate the score. Reference managers such as Mendeley are also tracked but do not contribute to the score. Older articles often score higher because they have had more time to get noticed. To account for this, Altmetric has included the context data for other articles of a similar age.