A MICROSCOPIC MECHANISM OF LOW TEMPERATURE HELIUM RELEASE

doi:10.1088/1004-423X/6/10/009

Abstract

Abstract ⁴He ions of various energies and at various doses were implanted into three kinds of samples: TiH₂ films, high purity Ti pieces as-received and after hydrogenation. Thermal release of helium was monitored in situ by proton-enhanced backscattering. Low-temperature helium release was observed at T≤573K. Single jump model was used to calculate the active energies for the release. Based on the observations, a mechanism of helium cluster vacancy complex (He_mV_n-V_i) for low temperature helium release is proposed.

Received: 13 August 1996
Accepted manuscript online:

PACS:	61.80.Jh	(Ion radiation effects)
	61.82.Ms	(Insulators)
	81.15.-z	(Methods of deposition of films and coatings; film growth and epitaxy)
	68.55.A-	(Nucleation and growth)

Fund: Project supported by the National Natural Science Foundation of China.

Cite this article:

GOU CHENG-LING (芶成玲), WANG PEI-XUAN (王佩璇), FANG ZHENG-ZHI (方正知), XIA ZONG-HUANG (夏宗璜), SHEN DING-YU (沈定予), WANG XUE-MEI (王雪梅) A MICROSCOPIC MECHANISM OF LOW TEMPERATURE HELIUM RELEASE 1997 Acta Physica Sinica (Overseas Edition) 6 771

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A MICROSCOPIC MECHANISM OF LOW TEMPERATURE HELIUM RELEASE

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