| CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES |
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Accuracy design of ultra-low residual reflection coatingsfor laser optics |
| Huasong Liu(刘华松)1,2, Xiao Yang(杨霄)1, Lishuan Wang(王利栓)1,2, Hongfei Jiao(焦宏飞)3, Yiqin Ji(季一勤)1,2, Feng Zhang(张锋)1, D an Liu(刘丹丹)1, Chenghui Jiang(姜承慧)1, Yugang Jiang(姜玉刚)1, Deying Chen(陈德应)2 |
1 Tianjin Key Laboratory of Optical Thin Film, Tianjin Jinhang Technical Physics Institute, HIWING Technology Academy of CASIC, Tianjin 300308, China;
2 National Key Laboratory of Science and Technology on Tunable Laser, Institute of Opto-electronics, Harbin Institute of Technology, Harbin 150080, China;
3 Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China |
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Abstract Refractive index inhomogeneity is one of the important characteristics of optical coating material, which is one of the key factors to produce loss to the ultra-low residual reflection coatings except using the refractive index inhomogeneity to obtain gradient-index coating. In the normal structure of antireflection coatings for center wavelength at 532 nm, the physical thicknesses of layer H and layer L are 22.18 nm and 118.86 nm, respectively. The residual reflectance caused by refractive index inhomogeneity (the degree of inhomogeneous is between –0.2 and 0.2) is about 200 ppm, and the minimum reflectivity wavelength is between 528.2 nm and 535.2 nm. A new numerical method adding the refractive index inhomogeneity to the spectra calculation was proposed to design the laser antireflection coatings, which can achieve the design of antireflection coatings with ppm residual reflection by adjusting physical thickness of the couple layers. When the degree of refractive index inhomogeneity of the layer H and layer L is –0.08 and 0.05 respectively, the residual reflectance increase from zero to 0.0769% at 532 nm. According to the above accuracy numerical method, if layer H physical thickness increases by 1.30 nm and layer L decrease by 4.50 nm, residual reflectance of thin film will achieve to 2.06 ppm. When the degree of refractive index inhomogeneity of the layer H and layer L is 0.08 and –0.05 respectively, the residual reflectance increase from zero to 0.0784% at 532 nm. The residual reflectance of designed thin film can be reduced to 0.8 ppm by decreasing the layer H of 1.55 nm while increasing the layer L of 4.94 nm.
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Received: 29 September 2016
Revised: 05 April 2017
Accepted manuscript online:
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PACS:
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78.20.-e
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(Optical properties of bulk materials and thin films)
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02.60.Cb
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(Numerical simulation; solution of equations)
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42.79.Fm
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(Reflectors, beam splitters, and deflectors)
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| Fund: Project supported by the National Natural Science Foundation of China (Grant Nos.61405145 and 61235011),the Natural Science Foundation of Tianjin,China (Grant No.15JCZDJC31900),and the China Postdoctoral Science Foundation (Grant Nos.2015T80115 and 2014M560104). |
Corresponding Authors:
Huasong Liu
E-mail: liuhuasong@hotmail.com
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Cite this article:
Huasong Liu(刘华松), Xiao Yang(杨霄), Lishuan Wang(王利栓), Hongfei Jiao(焦宏飞), Yiqin Ji(季一勤), Feng Zhang(张锋), D an Liu(刘丹丹), Chenghui Jiang(姜承慧), Yugang Jiang(姜玉刚), Deying Chen(陈德应) Accuracy design of ultra-low residual reflection coatingsfor laser optics 2017 Chin. Phys. B 26 077801
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