Changes of the electron dynamics in hydrogen inductively coupled plasma

doi:10.1088/1674-1056/22/11/115205

Abstract Changes of the electron dynamics in hydrogen (H₂) radio-frequency (RF) inductively coupled plasmas are investigated using a hairpin probe and an intensified charged coupled device (ICCD). The electron density, plasma emission intensity, and input current (voltage) are measured during the E to H mode transitions at different pressures. It is found that the electron density, plasma emission intensity, and input current jump up discontinuously, and the input voltage jumps down at the E to H mode transition points. And the threshold power of the E to H mode transition decreases with the increase of the pressure. Moreover, space and phase resolved optical emission spectroscopic measurements reveal that, in the E mode, the RF dynamics is characterized by one dominant excitation per RF cycle, while in the H mode, there are two excitation maxima within one cycle.

Keywords: mode transition inductively coupled plasma hairpin probe hydrogen

Received: 12 March 2013
Revised: 09 May 2013
Accepted manuscript online:

PACS:	52.70.-m	(Plasma diagnostic techniques and instrumentation)
	52.80.Pi	(High-frequency and RF discharges)
	52.50.Qt	(Plasma heating by radio-frequency fields; ICR, ICP, helicons)

Fund: Project supported by the National Natural Science Foundation of China (Grant Nos. 11075029, 11175034, and 11205025) and the Fundamental Research Funds for Central Universities, China (Grant No. DUT12RC(3)14).

Corresponding Authors: Wang You-Nian
E-mail: ynwang@dlut.edu.cn

Cite this article:

Gao Fei (高飞), Liu Wei (刘巍), Zhao Shu-Xia (赵书霞), Zhang Yu-Ru (张钰如), Sun Chang-Sen (孙长森), Wang You-Nian (王友年) Changes of the electron dynamics in hydrogen inductively coupled plasma 2013 Chin. Phys. B 22 115205

[1]	Rousseau A, Granier A, Gousset G and Leprince P 1994 J. Phys. D: Appl. Phys. 27 1412
[2]	Bachmann P K, Leers D and Lyatin H 1994 Diamond Relat. Mater. 1 1
[3]	Gottscho R A, Preppernau B L, Pearton S J, EmersonA B and Giappis K P 1990 J. Appl. Phys. 68 440
[4]	Gicquel A, Anger E, Ravet M F, Fabre D, Scatena D and Wang Z Z 1993 Diamond Relat. Mater. 2 417
[5]	Findeling-Dufour C, Gicquel A and Chiron R 1998 Diamond Relat. Mater. 7 986
[6]	Hou G F, Geng X H, Zhang X D, Sun J, Zhang J H and Zhao Y 2011 Chin. Phys. B 20 077802
[7]	Yan W S, Wei D Y, Xu S, Sern C C and Zhou H P 2011 J. Phys. D: Appl. Phys. 44 345401
[8]	Zhang H L, Liu F Z, Zhu M F and Liu J L 2012 Chin. Phys. B 21 015203
[9]	Lieberman M A and Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing (2nd edn) (New York: Wiley-Interscience)
[10]	Hopwood J 1993 Appl. Phys. Lett. 62 940
[11]	Lee M H, Lee K H, Hyun D S and Chung C W 2007 Appl. Phys. Lett. 90 191502
[12]	Singh S V 2008 J. Appl. Phys. 103 083303
[13]	Lee M H and Chung C W 2010 Plasma Sources Sci. Technol. 19 015011
[14]	Gao F, Li X C, Zhao S X and Wang Y N 2012 Chin. Phys. B 21 075203
[15]	Seo S H, Hong J I, Bai K H and Chang H Y 1999 Phys. Plasmas 6 614
[16]	Turner M M and Lieberman M A 1999 Plasma Sources Sci. Technol. 8 313
[17]	Seo S H, Hong J I and Chang H Y 1999 Appl. Phys. Lett. 74 2776
[18]	Cunge G, Crowley B, Vender D and Turner M M 1999 Plasma Sources Sci. Technol. 8 576
[19]	Ostrikov K N, Xu S and Yu M Y 2000 J. Appl. Phys. 88 2269
[20]	Xu S, Ostrikov K N, Low W and Lee S 2000 J. Vac. Sci. Technol. A 18 2185
[21]	Xu S, Ostrikov K N, Li Y, Taskadze E L and Jones I R 2001 Phys. Plasmas 8 2549
[22]	Chung C W and Chang H Y 2002 Appl. Phys. Lett. 80 1725
[23]	Ostrikov K N, Xu S and Shafiul Azam A B M 2002 J. Vac. Sci. Technol. A 20 251
[24]	Czerwiec T and Graves D B 2004 J. Phys. D: Appl. Phys. 37 2827
[25]	Kang D H, Lee D K, Kim K B and Lee J J 2004 Appl. Phys. Lett. 84 3283
[26]	Tsakadze Z L, Ostrikov K, Tsakadze E L and Xu S 2005 J. Vac. Sci. Technol. A 23 440
[27]	Singh S V, Kempkes P and Soltwisch H 2006 Appl. Phys. Lett. 89 161501
[28]	Tsai C M, Lee A P and Kou C S 2006 J. Phys. D: Appl. Phys. 39 3821
[29]	Daltrini A M, Moshkalev S A, Monteiro M J R, Besseler E, Kostryukov A and Machida M 2007 J. Appl. Phys. 101 073309
[30]	Iordanova S and Koleva I 2007 J. Phys.: Conf. Ser. 63 012026
[31]	Singh S V and Pargmann C 2008 J. Appl. Phys. 104 083303
[32]	Hirao S, Hayashi Y and Makabe T 2008 IEEE Trans. Plasma Sci. 36 1410
[33]	Daltrini A M, Moshkalev S A, Morgan T J, Piejak R B and Graham W G 2008 Appl. Phys. Lett. 92 061504
[34]	Zhao S X, Xu X, Li X C and Wang Y N 2009 J. Appl. Phys. 105 083306
[35]	Zhao S X, Gao F and Wang Y N 2009 J. Phys. D: Appl. Phys. 42 225203
[36]	Morishita S, Hayashi Y and Makabe T 2010 Plasma Sources Sci. Technol. 19 055007
[37]	Zhao S X and Wang Y N 2010 J. Phys. D: Appl. Phys. 43 275203
[38]	Lee Y W, Lee H L and Chung T H 2011 J. Appl. Phys. 109 113302
[39]	Miyoshi Y, Petrovic Z L and Makabe T 2002 J. Phys. D: Appl. Phys. 35 454
[40]	O’Connell D, Niemi K, Zaka-ul-Islam M and Gans T 2009 J. Phys.: Conf. Ser. 162 012011
[41]	Zaka-ul-Islam M, Niemi K, Gans T and O’Connell D 2011 Appl. Phys. Lett. 99 041501
[42]	Lee H C, Lee J K and Chung C W 2010 Phys. Plasmas 17 033506
[43]	Abdel-Rahman M, Gans T, Schulz-con der Gathen V and Dobele H F 2005 Plasma Sources Sci. Technol. 14 51
[44]	Abdel-Rahman M, Schulz-con der Gathen V and Gans T 2007 J. Phys. D: Appl. Phys. 40 1678
[45]	Gao F, Zhao S X, Li X S and Wang Y N 2009 Phys. Plasmas 16 113502
[46]	Gao F, Zhao S X, Li X S and Wang Y N 2010 Phys. Plasmas 17 103507
[47]	Piejak R B, Godyak V A, Garner R, Alexandrovich B M and Sternberg N 2004 J. Appl. Phys. 95 3785
[48]	Piejak R B, Al-Kuzee J and Braithwaite N S J 2005 Plasma Sources Sci. Technol. 14 734
[49]	Schulze J. Donko Z, Heil B G, Luggenholscher D, Brinkmann R P and Czarnetzki U 2008 J. Phys. D: Appl. Phys. 41 105214
[50]	Gans T, O’Connell D, Schulz-von der Gathen V and Waskoenig J 2010 Plasma Sources Sci. Technol. 19 034010

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Changes of the electron dynamics in hydrogen inductively coupled plasma

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