Please wait a minute...
Chin. Phys. B, 2011, Vol. 20(1): 015207    DOI: 10.1088/1674-1056/20/1/015207

Diagnosis of a low pressure capacitively coupled argon plasma by using a simple collisional-radiative model

Yu Yi-Qing(虞一青), Xin Yu(辛煜), and Ning Zhao-Yuan(宁兆元)
Jiangsu Key Laboratory of Thin Films, School of Physical Science and Technology, Soochow University, Suzhou 215006, China
Abstract  This paper proposes a simple collisional-radiative model to characterise capacitively coupled argon plasmas driven by conventional radio frequency in combination with optical emission spectroscopy and Langmuir probe measurements. Two major processes are considered in this model, electron-impact excitation and the spontaneous radiative decay. The diffusion loss term, which is found to be important for the two metastable states (4s[3/2]2, 4s'[1/2]0), is also taken into account. Behaviours of representative metastable and radiative states are discussed. Two emission lines (located at 696.5 nm and 750.4 nm) are selected and intensities are measured to obtain populated densities of the corresponding radiative states in the argon plasma. The calculated results agree well with that measured by Langmuir probe, indicating that the current model combined with optical emission spectroscopy is a candidate tool for electron density and temperature measurement in radio frequency capacitively coupled discharges.
Keywords:  capacitively coupled plasma      collisional-radiative model      optical emission spectroscopy      Langmuir probe  
Received:  07 April 2010      Revised:  02 August 2010      Accepted manuscript online: 
PACS:  52.80.Pi (High-frequency and RF discharges)  
  52.70.Kz (Optical (ultraviolet, visible, infrared) measurements)  
  52.25.Os (Emission, absorption, and scattering of electromagnetic radiation ?)  
Fund: Project supported by the National Natural Science Foundation of China (Grant Nos. 10635010 and 10775103).

Cite this article: 

Yu Yi-Qing(虞一青), Xin Yu(辛煜), and Ning Zhao-Yuan(宁兆元) Diagnosis of a low pressure capacitively coupled argon plasma by using a simple collisional-radiative model 2011 Chin. Phys. B 20 015207

[1] Lieberman M A and Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing (2nd ed.) (Hoboken, NJ: Wiley) pp1, 14, 299
[2] Huang S, Xin Y and Ning Z Y 2005 Chin. Phys. 14 1608
[3] Xu X, Li L S, Liu F, Zhou Q H and Liang R Q 2008 Chin. Phys. B 17 4242
[4] Nagai M and Horia M 2006 J. Vac. Sci. Technol. A 24 1760
[5] Yuan Y, Ye C, Huang H W, Shi G F and Ning Z Y 2010 Chin. Phys. B 19 065205
[6] Goto H H, Lowe H D and Ohmi T 1992 J. Vac. Sci. Technol. A 10 3048
[7] Boyle P C, Ellingboe A R and Turner M M 2004 J. Phys. D: Appl. Phys. 37 697
[8] Colgan M J, Meyyappan M and Murnick D E 1994 Plasma Sources Sci. Technol. 3 181
[9] Zhu X M, Chen W C, Zhang S, Guo Z G, Hu D W and Pu Y K 2007 J. Phys. D: Appl. Phys. 40 7019
[10] Chen F F 1965 in: Huddlestone R H and Leonard S L (eds.) Plasma Diagnostic Techniques (New York: Academic) p113
[11] Sudit I D and Chen F F 1994 Plasma Sources Sci. Technol. 3 162
[12] Ahn S K, You S J and Chang H Y 2006 Appl. Phys. Lett. 89 161506
[13] Ahn S K and Chang H Y 2009 Appl. Phys. Lett. 95 111502
[14] Donnelly V M 2004 J. Phys. D: Appl. Phys. 37 R217
[15] Malyshev M V and Donnelly V M 1999 Phys. Rev. E 60 6016
[16] Stafford L, Khare R, Donnelly V M, Margot J and Moisan M 2009 Appl. Phys. Lett. 94 021503
[17] Palmero A, van Hattum E D, Rudolph H and Habraken F H P M 2007 J. Appl. Phys. 101 053306
[18] Zhu X M and Pu Y K 2007 J. Phys. D: Appl. Phys. 40 2533
[19] Vlcek J 1989 J. Phys. D 22 623
[20] Bogaerts A, Gijbels R and Vlcek J 1998 J. Appl. Phys. 84 121
[21] Bultel A, van Ootegem B, Bourdon A and Vervisch P 2002 Phys. Rev. E 65 046406
[22] Iordanova S and Koleva I 2007 Spectrochim. Acta B 62 344
[23] Yanguas-Gil A, Cotrino J and Gonzalez-Elipe A R 2005 Phys Rev. E 72 016401
[24] Yanguas-Gil A, Cotrino J and Gonzalez-Elipe A R 2006 J. Appl. Phys. 99 033104
[25] Akatsuka H 2009 Phys. Plasmas 16 043502
[26] Boffard J B, Lin C C and DeJoseph Jr C A 2004 J. Phys. D: Appl. Phys. 37 R143
[27] Chutjian A and Cartwright D C 1981 Phys. Rev. A 23 2178
[28] Bretagne J, Godart J and Puech V 1982 J. Phys. D 15 2205
[29] Hyman H A 1978 Phys. Rev. A 18 441
[30] Kimura A, Kobayashi H, Nishida M and Valentin P 1985 J. Quant. Spectrosc. Radiat. Transfer 34 189
[31] Chilton J E, Boffard J B, Schappe R S and Lin C C 1998 Phys. Rev. A 57 267
[32] Boffard J B, Piech G A, Gehrke M F, Anderson L W and Lin C C 1999 Phys. Rev. A 59 2749
[33] Yanguas-Gil A, Cotrino J and Alves L L 2005 J. Phys. D: Appl. Phys. 38 1588
[34] NIST 2009 Atomic Spectra Database
[35] Wiese W L, Brault J W, Danzmann K, Helbig V and Kock M 1989 Phys. Rev. A 39 2461
[36] Lilly R A 1976 J. Opt. Soc. Am. 66 245
[37] Katsonis K and Drawin H W 1980 J. Quant. Spectrosc. Radiat. Transfer 23 1
[38] Holstein T 1951 Phys. Rev. 83 1159
[39] Zhu X M and Pu Y K 2010 J. Phys. D: Appl. Phys. 43 015204
[40] Boivin R F, Kline J L and Scime E E 2001 Phys. Plasmas 8 5303
[41] Chantry P J 1987 J. Appl. Phys. 62 1141
[42] Tachibana K 1986 Phys. Rev. A 34 1007
[43] Huang X J, Xin Y, Yuan Q H and Ning Z Y 2008 Phys. Plasmas 15 073501
[44] McWhirter R W P 1965 in: Huddlestone R H and Leonard S L (eds.) Plasma Diagnostic Techniques (New York: Academic) p201 endfootnotesize
[1] Spatial characteristics of nanosecond pulsed micro-discharges in atmospheric pressure He/H2O mixture by optical emission spectroscopy
Chuanjie Chen(陈传杰), Zhongqing Fang(方忠庆), Xiaofang Yang(杨晓芳), Yongsheng Fan(樊永胜), Feng Zhou(周锋), and Rugang Wang(王如刚). Chin. Phys. B, 2022, 31(2): 025204.
[2] Discharge characteristic of very high frequency capacitively coupled argon plasma
Gui-Qin Yin(殷桂琴), Jing-Jing Wang(王兢婧), Shan-Shan Gao(高闪闪), Yong-Bo Jiang(姜永博), and Qiang-Hua Yuan(袁强华). Chin. Phys. B, 2021, 30(9): 095204.
[3] Plasma characteristics and broadband electromagnetic wave absorption in argon and helium capacitively coupled plasma
Wen-Chong Ouyang(欧阳文冲), Qi Liu(刘琦), Tao Jin(金涛), and Zheng-Wei Wu(吴征威). Chin. Phys. B, 2021, 30(9): 095203.
[4] Time-resolved radial uniformity of pulse-modulated inductively coupled O2/Ar plasmas
Wei Liu(刘巍), Chan Xue(薛婵), Fei Gao(高飞), Yong-Xin Liu(刘永新), You-Nian Wang(王友年), and Yong-Tao Zhao(赵永涛). Chin. Phys. B, 2021, 30(6): 065202.
[5] Effect of pressure and space between electrodes on the deposition of SiNxHy films in a capacitively coupled plasma reactor
Meryem Grari, CifAllah Zoheir, Yasser Yousfi, and Abdelhak Benbrik. Chin. Phys. B, 2021, 30(5): 055205.
[6] Decomposition reaction of phosphate rock under the action of microwave plasma
Hui Zheng(郑慧), Meng Yang(杨猛), Cheng-Fa Jiang(江成发), and Dai-Jun Liu(刘代俊). Chin. Phys. B, 2021, 30(4): 045201.
[7] Analysis of extreme ultraviolet spectra of laser-produced Cd plasmas
Mohammedelnazier Bakhiet, Maogen Su(苏茂根), Shiquan Cao(曹世权), Qi Min(敏琦), Duixiong Sun(孙对兄), Siqi He(何思奇), Lei Wu(吴磊), Chenzhong Dong(董晨钟). Chin. Phys. B, 2020, 29(7): 075203.
[8] Measurements of argon metastable density using the tunable diode laser absorption spectroscopy in Ar and Ar/O2
Dao-Man Han(韩道满), Yong-Xin Liu(刘永新), Fei Gao(高飞), Wen-Yao Liu(刘文耀), Jun Xu(徐军), You-Nian Wang(王友年). Chin. Phys. B, 2018, 27(6): 065202.
[9] Understanding hydrogen plasma processes based on the diagnostic results of 2.45 GHz ECRIS at Peking University
Wen-Bin Wu(武文斌), Hai-Tao Ren(任海涛), Shi-Xiang Peng(彭士香), Yuan Xu(徐源), Jia-Mei Wen(温佳美), Jiang Sun(孙江), Ai-Lin Zhang(张艾霖), Tao Zhang(张滔), Jing-Feng Zhang(张景丰), Jia-Er Chen(陈佳洱). Chin. Phys. B, 2017, 26(9): 095204.
[10] Effect of driving frequency on electron heating in capacitively coupled RF argon glow discharges at low pressure
Tagra Samir, Yue Liu(刘悦), Lu-Lu Zhao(赵璐璐), Yan-Wen Zhou(周艳文). Chin. Phys. B, 2017, 26(11): 115201.
[11] Electrical and optical characteristics of the radio frequency surface dielectric barrier discharge plasma actuation
Wei-Long Wang(王蔚龙), Hui-Min Song(宋慧敏), Jun Li(李军), Min Jia(贾敏), Yun Wu(吴云), Di Jin(金迪). Chin. Phys. B, 2016, 25(4): 045203.
[12] One-dimensional hybrid simulation of the electrical asymmetry effectcaused by the fourth-order harmonic in dual-frequencycapacitively coupled plasma
Shuai Wang(王帅), Hai-Feng Long(龙海凤), Zhen-Hua Bi(毕振华), Wei Jiang(姜巍), Xiang Xu(徐翔), You-Nian Wang(王友年). Chin. Phys. B, 2016, 25(11): 115202.
[13] Characteristics of dual-frequency capacitively coupled SF6/O2 plasma and plasma texturing of multi-crystalline silicon
Xu Dong-Sheng (徐东升), Zou Shuai (邹帅), Xin Yu (辛煜), Su Xiao-Dong (苏晓东), Wang Xu-Sheng (王栩生). Chin. Phys. B, 2014, 23(6): 065201.
[14] Electronic dynamic behavior in inductively coupled plasmas with radio-frequency bias
Gao Fei (高飞), Zhang Yu-Ru (张钰如), Zhao Shu-Xia (赵书霞), Li Xue-Chun (李雪春), Wang You-Nian (王友年). Chin. Phys. B, 2014, 23(11): 115202.
[15] The effects of process conditions on the plasma characteristic in radio-frequency capacitively coupled SiH4/NH3/N2 plasmas: Two-dimensional simulations
Liu Xiang-Mei (刘相梅), Song Yuan-Hong (宋远红), Jiang Wei (姜巍), Yi Lin (易林). Chin. Phys. B, 2013, 22(4): 045204.
No Suggested Reading articles found!