| PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES |
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One-dimensional hybrid simulation of the electrical asymmetry effectcaused by the fourth-order harmonic in dual-frequencycapacitively coupled plasma |
| Shuai Wang(王帅)1, Hai-Feng Long(龙海凤)1, Zhen-Hua Bi(毕振华)2, Wei Jiang(姜巍)3, Xiang Xu(徐翔)4, You-Nian Wang(王友年)4 |
1 Department of Physics, College of Sciences, Northeastern University, Shenyang 110891, China;
2 Liaoning Key Lab of Optoelectronic Films & Materials, School of Physics and Materials Engineering, Dalian Nationalities University, Dalian 116600, China;
3 School of Physics, Huazhong University of Science and Technology, Wuhan 430074, China;
4 School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China |
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Abstract A one-dimensional hybrid model was developed to study the electrical asymmetry effect (EAE) caused by the fourth-order harmonic in a dual-frequency capacitively coupled Ar plasma. The self-bias voltage caused by the fourth-order frequency changes periodically with the phase angle, and the cycle of self-bias with the phase angle is π/2, which is half of that in the second-order case. The influence of the phase angle between the fundamental and its fourth-order frequency on the ion density profiles and the ion energy distributions (IEDs) were studied. Both the ion density profile and the IEDs can be controlled by the phase angle, which provides a convenient way to adjust the sheath characters without changing the main discharge parameters.
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Received: 19 May 2016
Revised: 26 June 2016
Accepted manuscript online:
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PACS:
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52.65.-y
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(Plasma simulation)
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52.80.Pi
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(High-frequency and RF discharges)
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| Fund: Project supported by the National Natural Science Foundation of China (Grant Nos. 11305032, 11305028, 11375163, and 11275039) and the Scientific Foundation of Ministry of Education of China (Grant No. N130405008). |
Corresponding Authors:
Shuai Wang
E-mail: s_wang@mail.neu.edu.cn
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Cite this article:
Shuai Wang(王帅), Hai-Feng Long(龙海凤), Zhen-Hua Bi(毕振华), Wei Jiang(姜巍), Xiang Xu(徐翔), You-Nian Wang(王友年) One-dimensional hybrid simulation of the electrical asymmetry effectcaused by the fourth-order harmonic in dual-frequencycapacitively coupled plasma 2016 Chin. Phys. B 25 115202
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| [1] |
Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Material Processing (New York:Weley)
|
| [2] |
Kim H C, Lee J K and Shon J W 2003 Phys. Plasmas 10 4545
|
| [3] |
Lieberman M A and Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing (2nd edn.) (New Jersey:Wiley Interscience)
|
| [4] |
Goto H H, Lowe H D and Ohmi T 1992 J. Vac. Sci. Technol. A 10 3048
|
| [5] |
Xu D S, Zou S, Xin Y, Su X D and Wang X S 2014 Chin. Phys. B 23 065201
|
| [6] |
Wakayama G and Nanbu K 2003 IEEE Trans. Plasma Sci. 31 638
|
| [7] |
Boyle P C, Ellingboe A R and Turner M M 2004 Plasma Sources Sci. Technol. 13 493
|
| [8] |
Turner M M and Chabert P 2006 Phys. Rev. Lett. 96 205001
|
| [9] |
Donkó Z and Petrovic L Z 2007 J. Phys. Conf. Ser. 86 012011
|
| [10] |
Schulze J, Donkó Z, Heil B G, Luggenhölscher D, Mussenbrock T, Brinkmann R P and Czarnetzki U 2008 J. Phys. D:Appl. Phys. 41 105214
|
| [11] |
Boyle P C, Ellingboe A R and Turner M M 2004 J. Phys. D:Appl. Phys. 37 697
|
| [12] |
Denda T, Miyoshi Y, Komukai Y, Goto T, Petrovic Z L and Makabe T 2004 J. Appl. Phys. 95 870
|
| [13] |
Gans T, Schulze J, O'Connell D, Czarnetzki U, Faulkner R, Ellingboe A R and Turner M M 2006 Appl. Phys. Lett. 89 261502
|
| [14] |
Schulze J, Gans T, O'Connell D, Czarnetzki U, Ellingboe A R and Turner M M 2007 J. Phys. D:Appl. Phys. 40 7008
|
| [15] |
Schulze J, Donk'o Z, Luggenölscher D and Czarnetzki U 2008 The 19$th European Sectional Conference on Atomic and Molecular Physics of Ionized Gases, July 15-19, 2008, Granada, Spain, p. 206
|
| [16] |
Semmler E, Awakowicz P and von Keudell A 2007 Plasma Sources Sci. Technol. 16 839
|
| [17] |
Salabas A and Brinkmann R P 2005 Plasma Sources Sci. Technol. 14 S53
|
| [18] |
Lee J K, Manuilenko O V, Babaeva N Y, Kim H C and Shon J W 2005 Plasma Sources Sci. Technol. 14 89
|
| [19] |
Kawamura E, Lieberman M A and Lichtenberg A J 2006 Phys. Plasmas 13 053506
|
| [20] |
Heil B G, Czarnetzki U, Brinkmann R P and Mussenbrock T 2008 J. Phys. D:Appl. Phys. 41 165202
|
| [21] |
Heil B G, Schulze J, Mussenbrock T, Brinkmann R P and Czarnetzki U 2008 IEEE Trans. Plasma Sci. 36 1404
|
| [22] |
Donkó Z, Schulze J, Heil B G and Czarnetzki U 2009 J. Phys. D:Appl. Phys. 42 025205
|
| [23] |
Schulze J, Schungel E and Czarnetzki U 2009 J. Phys. D:Appl. Phys. 42 092005
|
| [24] |
Schulze J, Schungel E, Czarnetzki U and Donkó Z 2009 J. Appl. Phys. 106 063307
|
| [25] |
Donkó Z, Schulze J, Czarnetzki U and Luggenholscher D 2009 Appl. Phys. Lett. 94 131501
|
| [26] |
Schulze J, Donkó Z, Luggenholscher D and Czarnetzki U 2009 Plasma Sources Sci. Technol. 18 034011
|
| [27] |
Schulze J, Schungel E, Donkó Z and Czarnetzki U 2010 Plasma Sources Sci. Technol. 19 045028
|
| [28] |
Lieberman M A 1988 IEEE Trans. Plasma Sci. 16 638
|
| [29] |
Lieberman M A and Godyak V A 1998 IEEE Trans. Plasma Sci. 26 955
|
| [30] |
Surendra M and Graves D B 1991 Phys. Rev. Lett. 66 1469
|
| [31] |
Turner M M 1995 Phys. Rev. Lett. 75 1312
|
| [32] |
Gozadinos G, Turner M M and Vender D 2001 Phys. Rev. Lett. 87 135004
|
| [33] |
Kaganovich I D 2002 Phys. Rev. Lett. 89 265006
|
| [34] |
Kaganovich I D, Polomarov O V and Theodosioue C E 2006 IEEE Trans. Plasma Sci. 34 696
|
| [35] |
Gans T, Schulz-von der Gathen V and Döbele H F 2004 Europhys. Lett. 66 232
|
| [36] |
Mussenbrock T and Brinkmann R P 2006 Appl. Phys. Lett. 88 151503
|
| [37] |
Mussenbrock T, Brinkmann R P, Lieberman M A, Lichtenberg A J and Kawamura E 2008 Phys. Rev. Lett. 101 085004
|
| [38] |
Czarnetzki U, Mussenbrock T and Brinkmann R P 2006 Phys. Plasmas 13 123503
|
| [39] |
Ziegler D, Mussenbrock T and Brinkmann R P 2008 Plasma Sources Sci. Technol. 17 045011
|
| [40] |
Schulze J, Heil B G, Luggenhölscher D, Brinkmann R P and Czarnetzki U 2008 J. Phys. D:Appl. Phys. 41 195212
|
| [41] |
Turner M M 2009 J. Phys. D:Appl. Phys. 42 194008
|
| [42] |
Jiang W, Xu X, Dai Z L and Wang Y N 2008 Phys. Plasmas 15 033502
|
| [43] |
Zhang Q Z, Jiang W, Zhao S X and Wang Y N 2010 J. Vac. Sci. Technol. A 28 287
|
| [44] |
Lisovskiy V A and Yegorenkov V D 1994 J. Phys. D:Appl. Phys. 27 2340
|
| [45] |
Lisovskiy V A, Kharchenko N D and Yegorenkov V D 2008 J. Phys. D:Appl. Phys. 41 125207
|
| [46] |
Lisovskiy V A, Kharchenko N D and Yegorenkov V D 2010 J. Phys. D:Appl. Phys. 43 425202
|
| [47] |
Schulze J, Derzsi A and Donk Z 2011 Plasma Sources Sci. Technol. 20 045008
|
| [48] |
Sommerer T J and Kushner M J 1992 J. Appl. Phys. 71 1654
|
| [49] |
Ventzek P L G, Sommerer T J, Hoekstra R J and Kushner M J 1993 Appl. Phys. Lett. 63 605
|
| [50] |
Kratzer M, Brinkmann R P, Sabischa W and Schmidt H J 2001 J. Appl. Phys. 90 2169
|
| [51] |
Sato N and Tagashira H 1991 IEEE Trans. Plasma Sci. 19 102
|
| [52] |
Nitschke T E and Graves D B 1994 J. Appl. Phys. 76 5646
|
| [53] |
Bukowski J D and Graves D B 1996 J. Appl. Phys. 80 2614
|
| [54] |
Vahedi V and Surendra M 1995 Comput. Phys. Commun. 87 179
|
| [55] |
Vahedi V, Birdsall C K and Lieberman M A 1993 Phys. Fluids B 5 2719
|
| [56] |
Wang H Y, Jiang W, Sun P and Kong L B 2014 Chin. Phys. B 23 035204
|
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