Please wait a minute...
Chin. Phys. B, 2010, Vol. 19(9): 090701    DOI: 10.1088/1674-1056/19/9/090701
GENERAL Prev   Next  

Spectroscopic ellipsometric study of the optical properties of Ag2O film prepared by direct-current magnetron reactive sputtering

Gao Xiao-Yong(郜小勇), Feng Hong-Liang(冯红亮), Ma Jiao-Min(马姣民), and Zhang Zeng-Yuan(张增院)
The Key Laboratory of Material Physics of Ministry of Education, School of Physics and Engineering, Zhengzhou University, Zhengzhou 450052, China
Abstract  The Ag2O film, as-deposited by direct-current magnetron reactive sputtering at a substrate temperature of 150 ℃, clearly shows a preferential orientation (111), and is capable of lowering the threshold value of the thermal decomposition temperature to about 200 ℃, which is helpful to its application in optical and magneto-optical storage. This paper fits its optical constants in terms of a general oscillator model by using measured ellipsometric parameters. The fitted oscillator energy 2.487 eV is close to the optical direct interband transition energy value of the Ag2O film determined by Tauc equation; whereas, the fitted oscillator energy 4.249 eV is far from the fitted plasma oscillator energy 4.756 eV by single-oscillator energy. The photoluminescence spectrum centred at about 2.31 eV indicates a direct-energy gap photoluminescence mechanism of the Ag2O film.
Keywords:  Ag2O film      spectroscopic ellipsometry      general oscillator model      single-oscillator model  
Received:  15 October 2009      Revised:  09 December 2009      Accepted manuscript online: 
PACS:  0760F  
  7865P  
  4270Q  
  3360F  
Fund: Project supported by the National Natural Science Foundation of China (Grant No. 60807001) and Foundation of Henan Educational Committee (Grant No. 2010A140017).

Cite this article: 

Gao Xiao-Yong(郜小勇), Feng Hong-Liang(冯红亮), Ma Jiao-Min(马姣民), and Zhang Zeng-Yuan(张增院) Spectroscopic ellipsometric study of the optical properties of Ag2O film prepared by direct-current magnetron reactive sputtering 2010 Chin. Phys. B 19 090701

[1] Kotz R and Yeager E 1980 J. Electroanal. Chem. 111 105
[2] Fuji H, Tominaga J, Men L, Nakano T, Katayama H and Atoda N 2000 Jpn. J. Appl. Phys. 39 980
[3] Varkey A J and Fort A F 1993 Sol. Energy Mater. Sol. Cells 29 253
[4] Hou S M, Ouyang M, Chen H F, Liu W M, Xue Z Q, Wu Q D, Zhang H X, Gao H J and Pang S J 1998 Thin Solid Films 315 322
[5] Kim J, Fuji H, Yamakama Y, Nakano T, Buechel D, Tomianaga J and Atoda N 2001 Jpn. J. Appl. Phys. 40 1634
[6] Chiu Y, Rambabu U, Hsu M H, Shieh H P D, Chen C Y and Lin H H 2003 J. Appl. Phys. 94 1996
[7] Peyser L A, Vinson A E, Bartko A P and Dickson R M 2001 Science 191 103
[8] Zhang X Y, Pan X Y, Zhang Q F, Xu B X, Jiang H B, Liu C L, Gong Q H and Wu J L 2003 Acta Phys. Chim. Sin. 19 203 (in Chinese)
[9] Gao X Y, Wang S Y, Li J, Zheng Y X, Zhang R J, Zhou P, Yang Y M and Chen L Y 2004 Thin Solid Films 455--456 438
[10] Gao X Y, Liu X W, Wang S Y, Liu Y F, Lin Q G and Lu J X 2008 Chin. Phys. Lett. 25 1449
[11] Qiu J H, Zhou P, Gao X Y, Yu J N, Wang S Y, Li J, Zheng Y X, Yang Y M, Song Q H and Chen L Y 2005 J. Korean Phys. Soc. 46 S269
[12] Peterrsson L A A and Snyder P G 1995 Thin Solid Films 270 69
[13] Gao X Y, Li R, Chen Y S, Lu J X, Liu P, Feng T H, Wang H J and Yang S E 2006 Acta Phys. Sin. 55 98 (in Chinese)
[14] Singh R, Fakhraddin M and Poole K F 2000 Appl. Sur. Sci. 168 198
[15] Fujiwara H 2007 Spectroscopic Ellipsometry Principles and Applications (WILEY) p45
[16] Gu J H, Ding Y L, Yang S E, Gao X Y, Chen Y S and Lu J X 2009 Acta Phys. Sin. 58 4123 (in Chinese)
[17] Jiang H Q, Yao X, Che J and Wang M Q 2006 Acta Phys. Sin. 55 2084 (in Chinese)
[18] Lin Q G 2009 MS Thesis (Zhengzhou: Zhengzhou University) (in Chinese)
[19] Watanabe D and Castle J R 1967 Acta Cryst. 23 307
[20] Wemple S H and DiDomenico M 1971 Phys. Rev. B 3 1338
[21] Hopfield J J 1970 Phys. Rev. B 2 973
[22] Schmidt A A, Offermann J and Anton R 1996 Thin Solid Films 281--282 105 endfootnotesize
[1] Gradient refractive structured NiCr thin film absorber for pyroelectric infrared detectors
Yunlu Lian(练芸路), He Yu(于贺), Zhiqing Liang(梁志清), Xiang Dong(董翔). Chin. Phys. B, 2019, 28(6): 067801.
[2] Study on electrical defects level in single layer two-dimensional Ta2O5
Dahai Li(李大海), Xiongfei Song(宋雄飞), Linfeng Hu(胡林峰), Ziyi Wang(王子仪), Rongjun Zhang(张荣君), Liangyao Chen(陈良尧), David Wei Zhang(张卫), Peng Zhou(周鹏). Chin. Phys. B, 2016, 25(4): 047304.
[3] Optical properties of aluminum-doped zinc oxide films deposited by direct-current pulse magnetron reactive sputtering
Gao Xiao-Yong (郜小勇), Chen Chao (陈超), Zhang Sa (张飒). Chin. Phys. B, 2014, 23(3): 030701.
[4] Optical study of Ba(MnxTi(1-x)O3) thin films by spectroscopic ellipsometry
Zhang Ting (张婷), Yin Jiang (殷江), Ding Ling-Hong (丁玲红), Zhang Wei-Feng (张伟风). Chin. Phys. B, 2013, 22(11): 117801.
[5] Tunable structural color of anodic tantalum oxide films
Sheng Cui-Cui (盛翠翠), Cai Yun-Yu (蔡云雨), Dai En-Mei (代恩梅), Liang Chang-Hao (梁长浩 ). Chin. Phys. B, 2012, 21(8): 088101.
[6] Mixed polarization in determining the film thickness of a silicon sphere by spectroscopic ellipsometry
Zhang Ji-Tao(张继涛), Wu Xue-Jian(吴学健), and Li Yan(李岩) . Chin. Phys. B, 2012, 21(1): 010701.
[7] Effect of substrate temperature on microstructure and optical properties of single-phased Ag2O film deposited by using radio-frequency reactive magnetron sputtering method
Ma Jiao-Min(马姣民), Liang Yan(梁艳), Gao Xiao-Yong(郜小勇), Zhang Zeng-Yuan(张增院), Chen Chao(陈超), Zhao Meng-Ke(赵孟珂), Yang Shi-E(杨仕娥), Gu Jin-Hua(谷锦华), Chen Yong-Sheng(陈永生), and Lu Jing-Xiao(卢景霄). Chin. Phys. B, 2011, 20(5): 056102.
[8] Deposition pressure effect on the surface roughness scaling of microcrystalline silicon films
Zhu Zhi-Li(朱志立), Ding Yan-Li(丁艳丽), Wang Zhi-Yong(王志永), Gu Jin-Hua(谷锦华), and Lu Jing-Xiao(卢景霄). Chin. Phys. B, 2010, 19(10): 106803.
No Suggested Reading articles found!