a Materials Science and Engineering School, University of Science and Technology Beijing, Beijing 100083, China; b Beijing Laboratory of Vacuum Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100080, China
Abstract The crystalline carbon nitride thin films have been prepared on Si (100) substrates using microwave plasma chemical vapor deposition technique. The experimental X-ray diffraction pattern of the films prepared contain all the strong peaks of $\alpha$-C3N4 and $\beta$-C3N4, but most of the peaks are overlapped.The films are composed of $\alpha$-C3N4 and $\beta$-C3N4. The N/C atomic ratio is close to the stoichiometric value 1.33. X-ray photoelectron spectroscopic analysis indicated that the binding energies of C 1s and N 1s are 286.43eV and 399.08 eV respectively. The shifts are attributed to the polarization of C-N bond. Both observed Raman and Fourier transform infrared spectra were compared with the theoretical calculations. The results support the existence of C-N covalent bond in $\alpha$- and $\beta$-C3N4 mixture.
Received: 21 December 1999
Revised: 21 March 2000
Accepted manuscript online:
Fund: Project supported by the National Natural Science Foundation of China(Grant No. 19674009 and Beijing Laboratory of Vacuum Physics, Chinese Academy of Sciences.
Cite this article:
Zhang Yong-ping (张永平), Gu You-song (顾有松), Chang Xiang-rong (常香荣), Tian Zhong-zhuo (田中卓), Shi Dong-xia (时东霞), Zhang Xiu-fang (张秀芳), Yuan Lei (袁磊) CRYSTALLINE CARBON NITRIDE THIN FILMS DEPOSITED BY MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION 2000 Chinese Physics 9 545
The 50 nm-thick yttrium iron garnet films with perpendicular magnetic anisotropy Shuyao Chen(陈姝瑶), Yunfei Xie(谢云飞), Yucong Yang(杨玉聪), Dong Gao(高栋), Donghua Liu(刘冬华), Lin Qin(秦林), Wei Yan(严巍), Bi Tan(谭碧), Qiuli Chen(陈秋丽), Tao Gong(龚涛), En Li(李恩), Lei Bi(毕磊), Tao Liu(刘涛), and Longjiang Deng(邓龙江). Chin. Phys. B, 2022, 31(4): 048503.
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