Abstract A large volume, high density, and pagoda-shaped radio frequency (rf) plasma source has been developed for use in large scale plasma processing. The inductively coupled plasma (ICP) is created by a pagoda-shaped 13.65 MHz antenna to improve the plasma uniformity on substrate. Plasma densities and electron temperatures are measured by using a Langmuir probe and their radial and axial profiles are attained. Electron density of >1×1011 cm-3 on the substrate and uniform to $\leqslant$±1.6% over 16 cm diameter can be produced at argon pressure of 6.65×10-1 Pa and input rf power of 1 kW. ICP etching photoresist in O2 plasma has been tested and the etching uniformity consists with that of the plasma density on the substrate. A large scale etched sample with the uniformity to $\leqslant$±1.1% over 10 cm diameter or to $\leqslant$±2.2% over 13 cm diameter has been obtained.
Received: 09 March 1998
Revised: 20 May 1998
Accepted manuscript online:
Yao Xin-zi (姚鑫兹), Jiang De-yi (江德仪), Liu Xun-chun (刘训春), Ye Tian-chun (叶甜春) BEHAVIOR OF PLASMA FORMED IN A PAGODA-SHAPED RADIO FREQUENCY PLASMA SOURCE 1998 Acta Physica Sinica (Overseas Edition) 7 823
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