Photoresponsive characteristics of thin film transistors with perovskite quantum dots embedded amorphous InGaZnO channels

doi:10.1088/1674-1056/ab9738

Abstract Photodetectors based on amorphous InGaZnO (a-IGZO) thin film transistor (TFT) and halide perovskites have attracted attention in recent years. However, such a stack assembly of a halide perovskite layer/an a-IGZO channel, even with an organic semiconductor film inserted between them, easily has a very limited photoresponsivity. In this article, we investigate photoresponsive characteristics of TFTs by using CsPbX₃ (X=Br or I) quantum dots (QDs) embedded into the a-IGZO channel, and attain a high photoresponsivity over 10³A·W^-1, an excellent detectivity in the order of 10¹⁶ Jones, and a light-to-dark current ratio up to 10⁵ under visible lights. This should be mainly attributed to the improved transfer efficiency of photoelectrons from the QDs to the a-IGZO channel. Moreover, spectrally selective photodetection is demonstrated by introducing halide perovskite QDs with different bandgaps. Thus, this work provides a novel strategy of device structure optimization for significantly improving the photoresponsive characteristics of TFT photodetectors.

Keywords: perovskite quantum dots a-IGZO thin-film transistor photoresponsive characteristics

Received: 22 April 2020
Published: 05 July 2020

PACS:	85.60.Gz	(Photodetectors (including infrared and CCD detectors))
	81.07.Ta	(Quantum dots)
	85.30.Tv	(Field effect devices)
	81.05.Gc	(Amorphous semiconductors)

Fund: Project supported by the National Natural Science Foundation of China (Grant No. 61874029) and the National Key Technologies R&D Program of China (Grant No. 2015ZX02102-003).

Corresponding Authors: Xiaohan Wu, Shi-Jin Ding
E-mail: wuxiaohan@fudan.edu.cn;sjding@fudan.edu.cn

Cite this article:

Mei-Na Zhang(张美娜), Yan Shao(邵龑), Xiao-Lin Wang(王晓琳), Xiaohan Wu(吴小晗), Wen-Jun Liu(刘文军), Shi-Jin Ding(丁士进) Photoresponsive characteristics of thin film transistors with perovskite quantum dots embedded amorphous InGaZnO channels 0 Chin. Phys. B 88503

[1] Nomura K, Ohta H, Takagi A, Kamiya T, Hirano M and Hosono H 2004 Nature 432 488
[2] Chuang C S, Fung T C, Mullins B G, Nomura K, Kamiya T, Shieh H P D, Hosono H and Kanicki J 2008 Proc. Soc. Inf. Display 39 1215
[3] Kamiya T, Nomura K and Hosono H 2010 Sci. Technol. Adv. Mater 11 044305
[4] Fortunato E, Barquinha P and Martins R 2012 Adv. Mater. 24 2945
[5] Heremans P, Tripathi A K, de Jamblinne de Meux A, Smits E C, Hou B, Pourtois G and Gelinck G H 2016 Adv. Mater. 28 4266
[6] Sheng J, Lee H J, Oh S and Park J S 2016 ACS Appl. Mater. Interfaces 8 33821
[7] Zhang Y H, Mei Z X, Liang H L and Du X L 2017 Chin. Phys. B 26 047307
[8] Xiao X, Zhang L, Shao Y, Zhou X, He H and Zhang S 2018 ACS Appl. Mater Interfaces 10 25850
[9] Zan H W, Chen W T, Hsueh H W, Kao S C, Ku M C, Tsai C C and Meng H F 2010 Appl. Phys. Lett. 97 203506
[10] Wang H, Xiao Y, Chen Z, Xu W, Long M and Xu J B 2015 Appl. Phys. Lett. 106 242102
[11] Liu J, Wen H and Shen L 2020 Nanotechnology 31 214001
[12] Xu Y and Lin Q 2020 Appl. Phys. Rev. 7 011315
[13] Wang Y F, Qu F D, Zhou J R, Guo W B, Dong W, Liu C X, Ruan S P 2015 Chin. Phys. Lett. 32 88504
[14] Yang J, Kwak H, Lee Y, Kang Y S, Cho M H, Cho J H, Kim Y H, Jeong S J, Park S, Lee H J and Kim H 2016 ACS Appl. Mater. Interfaces 8 8576
[15] Pak S W, Chu D, Song D Y, Lee S K and Kim E K 2017 Nanotechnology 28 475206
[16] Pei Z, Lai H C, Wang J Y, Chiang W H and Chen C H 2015 IEEE Electron Device Lett. 36 44
[17] Shin S W, Lee K H, Park J S and Kang S J 2015 ACS Appl. Mater. Interfaces 7 19666
[18] Hwang D K, Lee Y T, Lee H S, Lee Y J, Shokouh S H, Kyhm J h, Lee J, Kim H H, Yoo T H, Nam S H, Son D I, Ju B K, Park M C, Song J D, Choi W K and Im S 2016 NPG Asia Mater. 8 e233
[19] Weng Q C, An Z H, Xiong D Y and Zhu Z Q 2015 Chin. Phys. Lett. 32 108503
[20] Du S, Li G, Cao X, Wang Y, Lu H, Zhang S, Liu C and Zhou H 2017 Adv. Electron. Mater. 3 1600325
[21] Sun M, Fang Q, Zhang Z, Xie D, Sun Y, Xu J, Li W, Ren T and Zhang Y 2018 ACS Appl. Mater Interfaces 10 7231
[22] Tak Y J, Kim D J, Kim W G, Lee J H, Kim S J, Kim J H and Kim H J 2018 ACS Appl. Mater. Interfaces 10 12854
[23] Xu X, Yan L, Zou T, Qiu R, Liu C, Dai Q, Chen J, Zhang S and Zhou H 2018 ACS Appl. Mater. Interfaces 10 44144
[24] Na H J, Cho N K, Park J, Lee S E, Lee E G, Im C and Kim Y S 2019 J. Mater. Chem. C 7 14223
[25] Wei S, Wang F, Zou X, Wang L, Liu C, Liu X, Hu W, Fan Z, Ho J C and Liao L 2019 Adv. Mater. 32 1907527
[26] Yu H, Liu X, Yan L, Zou T, Yang H, Liu C, Zhang S and Zhou H 2019 Semicond. Sci. Technol. 34 125013
[27] Liu C K, Tai Q, Wang N, Tang G, Loi H L and Yan F 2019 Adv. Sci. 6 1900751
[28] Wang Y, Song L, Chen Y and Huang W 2019 ACS Photon. 7 10
[29] Zhao Y, Li C and Shen L 2019 InfoMat 1 164
[30] Li C, Wang H, Wang F, Li T, Xu M, Wang H, Wang Z, Zhan X, Hu W and Shen L 2020 Light Sci. Appl. 9 31
[31] Tiebin Yang F L, Rongkun Zheng 2019 ACS Appl. Electron. Mater. 1 1348
[32] Zhang C, Kuang D B and Wu W Q 2020 Small Methods 4 1900662
[33] Ramasamy P, Lim D H, Kim B, Lee S H, Lee M S and Lee J S 2016 Chem. Commun. 52 2067
[34] Bi C, Wang S, Wen W, Yuan J, Cao G and Tian J 2018 J. Phys. Chem. C 122 5151
[35] Bi C, Wang S, Li Q, Kershaw S V, Tian J and Rogach A L 2019 J. Phys. Chem. Lett. 10 943
[36] Lao X, Li X, Agren H and Chen G 2019 Nanomaterials 9 172
[37] Wang Y, Gao M L, Wu J L, Zhang X W 2019 Chin. Phys. B 28 18502
[38] Chen W, Hao J, Hu W, Zang Z, Tang X, Fang L, Niu T and Zhou M 2017 Small 13 1604085
[39] Chen Y, Chu Y, Wu X, Ou-Yang W and Huang J 2017 Adv. Mater. 29 1704062
[40] Davis N J, de la Pena F J, Tabachnyk M, Richter J M, Lamboll R D, Booker E P, Wisnivesky Rocca Rivarola F, Griffiths J T, Ducati C, Menke S M, Deschler F and Greenham N C 2017 J. Phys. Chem. C Nanomater Interfaces 121 3790
[41] Yu Y, Zhang Y, Song X, Zhang H, Cao M, Che Y, Dai H, Yang J, Zhang H and Yao J 2017 Adv. Opt. Mater. 5 1700565
[42] Cai Z, Li F, Xu W, Xia S, Zeng J, He S and Chen X 2018 Nano Res. 11 1447
[43] Liao J F, Xu Y F, Wang X D, Chen H Y and Kuang D B 2018 ACS Appl. Mater. Interfaces 10 42301
[44] Jiang D W, Xiang W, Guo F Y, Hao H Y, Han X, Li X C, Wang G W, Xu Y Q, Yu Q J and Niu Z C 2016 Chin. Phys. Lett. 33 48502
[45] Yong W, Hao L, You L X, Lv C L, Wang H Q, Zhang X Y, Zhang W J, Zhou H, Zhang L, Yang X Y and Wang Z 2019 Chin. Phys. B 28 78502
[46] Li X, Yu D, Cao F, Gu Y, Wei Y, Wu Y, Song J and Zeng H 2016 Adv. Funct. Mater. 26 5903
[47] Shao Y, Wu X, Zhang M N, Liu W J and Ding S J 2019 Nanoscale Res. Lett. 14 122
[48] Fang Y, Dong Q, Shao Y, Yuan Y and Huang J 2015 Nat. Photon. 9 679
[49] Song J, Xu L, Li J, Xue J, Dong Y, Li X and Zeng H 2016 Adv. Mater. 28 4861
[50] Chen Y, Wu X, Chu Y, Zhou J, Zhou B and Huang J 2018 Nanomicro Lett. 10 57
[51] Ma X F, Huang Y Q, Zhi Y S, Wang X, Li P G, Wu Z P and Tang W H 2019 Chin. Phys. B 28 88503
[52] Fang H and Hu W 2017 Adv. Sci. 4 1700323
[53] Long L, Cao D, Fei J, Wang J, Zhou Y, Jiang Z, Jiao Z and Shu H 2019 Chem. Phys. Lett. 734 136719
[54] Azpiroz J M, Mosconi E, Bisquert J and De Angelis F 2015 Energy Environ. Sci. 8 2118
[55] Podzorov V and Gershenson M E 2005 Phys. Rev. Lett. 95 016602

[1]	Photoresponsive characteristics of thin film transistors with perovskite quantum dots embedded amorphous InGaZnO channels Mei-Na Zhang(张美娜), Yan Shao(邵龑), Xiao-Lin Wang(王晓琳), Xiaohan Wu(吴小晗), Wen-Jun Liu(刘文军), Shi-Jin Ding(丁士进). Chin. Phys. B, 2020, 29(7): 078503.
[2]	A systematic study of light dependency of persistent photoconductivity in a-InGaZnO thin-film transistors Yalan Wang(王雅兰), Mingxiang Wang(王明湘), Dongli Zhang(张冬利), Huaisheng Wang(王槐生). Chin. Phys. B, 2020, 29(11): 118101.
[3]	Investigation and active suppression of self-heating induced degradation in amorphous InGaZnO thin film transistors Dong Zhang(张东), Chenfei Wu(武辰飞), Weizong Xu(徐尉宗), Fangfang Ren(任芳芳), Dong Zhou(周东), Peng Yu(于芃), Rong Zhang(张荣), Youdou Zheng(郑有炓), Hai Lu(陆海). Chin. Phys. B, 2019, 28(1): 017303.
[4]	Water-based processed and alkoxide-based processed indium oxide thin-film transistors at different annealing temperatures Xu-Yang Li(栗旭阳), Zhi-Nong Yu(喻志农), Jin Cheng(程锦), Yong-Hua Chen(陈永华), Jian-She Xue(薛建设), Jian Guo(郭建), Wei Xue(薛唯). Chin. Phys. B, 2018, 27(4): 048504.
[5]	Review of flexible and transparent thin-film transistors based on zinc oxide and related materials Yong-Hui Zhang(张永晖), Zeng-Xia Mei(梅增霞), Hui-Li Liang(梁会力), Xiao-Long Du(杜小龙). Chin. Phys. B, 2017, 26(4): 047307.
[6]	Contact resistance asymmetry of amorphous indium-gallium-zinc-oxide thin-film transistors by scanning Kelvin probe microscopy Chen-Fei Wu(武辰飞), Yun-Feng Chen(陈允峰), Hai Lu(陆海), Xiao-Ming Huang(黄晓明), Fang-Fang Ren(任芳芳), Dun-Jun Chen(陈敦军), Rong Zhang(张荣), You-Dou Zheng(郑有炓). Chin. Phys. B, 2016, 25(5): 057306.
[7]	Temperature-dependent bias-stress-induced electrical instability of amorphous indium-gallium-zinc-oxide thin-film transistors Qian Hui-Min, Yu Guang, Lu Hai, Wu Chen-Fei, Tang Lan-Feng, Zhou Dong, Ren Fang-Fang, Zhang Rong, Zheng You-Liao, Huang Xiao-Ming. Chin. Phys. B, 2015, 24(7): 077307.
[8]	Electrical properties of zinc-oxide-based thin-film transistors using strontium-oxide-doped semiconductors Wu Shao-Hang, Zhang Nan, Hu Yong-Sheng, Chen Hong, Jiang Da-Peng, Liu Xing-Yuan. Chin. Phys. B, 2015, 24(10): 108504.
[9]	Positive gate-bias temperature instability of ZnO thin-film transistor Liu Yu-Rong, Su Jing, Lai Pei-Tao, Yao Ruo-He. Chin. Phys. B, 2014, 23(6): 068501.
[10]	Effects of annealing process on characteristics of fully transparent zinc tin oxide thin-film transistor Chen Yong-Yue, Wang Xiong, Cai Xi-Kun, Yuan Zi-Jian, Zhu Xia-Ming, Qiu Dong-Jiang, Wu Hui-Zhen. Chin. Phys. B, 2014, 23(2): 026101.
[11]	Study on characteristics of a double-conductible channel organic thin-films transistor with an ultra-thin hole-blocking layer Yuan Guang-Cai, Xu Zheng, Zhao Su-Ling, Zhang Fu-Jun, Xu Na, Tian Xue-Yan, Xu Xu-Rong. Chin. Phys. B, 2009, 18(9): 3990-3994.
[12]	Characteristics of pentacene organic thin film transistor with top gate and bottom contact Yuan Guang-Cai, Xu Zheng, Zhao Su-Ling, Zhang Fu-Jun, Jiang Wei-Wei, Song Dan-Dan, Zhu Hai-Na, Li Shao-Yan, Huang Jin-Ying, Huang Hao, Xu Xu-Rong. Chin. Phys. B, 2008, 17(5): 1887-1892.
[13]	The effect of annealing temperature and film thickness on the phase of pentacene on the p⁺-Si substrate Yuan Guang-Cai, Xu Zheng, Zhao Su-Ling, Zhang Fu-Jun, Huang Jin-Zhao, Huang Jin-Ying, Tian Xue-Yan, Xu Xu-Rong. Chin. Phys. B, 2008, 17(10): 3822-3826.

No Suggested Reading articles found!

Viewed

Full text

Abstract

Cited

Shared

Discussed

Metrics
Related Articles