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Chin. Phys. B, 2012, Vol. 21(7): 075203    DOI: 10.1088/1674-1056/21/7/075203
PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES Prev   Next  

Spatial variation behaviors of argon inductively coupled plasma during discharge mode transition

Gao Fei(高飞)a), Li Xue-Chun(李雪春)a), Zhao Shu-Xia(赵书霞)b), and Wang You-Nian(王友年)a)†
a School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China;
b Research Group PLASMANT, Department of Chemistry, University of Antwerp, Universiteitsplein 1, B-2610 Antwerp, Belgium
Abstract  A Langmuir probe and an ICCD are employed to study the discharge mode transition in an Ar inductively coupled plasma. Electron density and plasma emission intensity are measured during the E (capacitive discharge) to H (inductive discharge) mode transitions at different pressures. It is found that plasma exists with a low electron density and a weak emission intensity in the E mode, while it has a high electron density and a strong emission intensity in the H mode. Meanwhile, the plasma emission intensity spatial (2D image) profile is symmetrical in the H mode, but the 2D image is an asymmetric profile in the E mode. Moreover, the electron density and emission intensity jump up discontinuously at high pressure, but increase almost continuously at the E to H mode transition under low pressure.
Keywords:  mode transition      inductively coupled plasma      Langmuir probe      ICCD  
Received:  27 September 2011      Revised:  04 November 2011      Accepted manuscript online: 
PACS:  52.70.-m (Plasma diagnostic techniques and instrumentation)  
  52.80.Pi (High-frequency and RF discharges)  
  52.50.Qt (Plasma heating by radio-frequency fields; ICR, ICP, helicons)  
Fund: Project supported by the National Natural Science Foundation of China (Grant Nos. 11075029 and 11175034), the Specialized Research Fund for the Doctoral Program of Higher Education of China (Grant No. 20090041110026), and the Fundamental Research Funds for Central Universities of China(Grant No. DUT11ZD109).
Corresponding Authors:  Wang You-Nian     E-mail:  ynwang@dlut.edu.cn

Cite this article: 

Gao Fei(高飞), Li Xue-Chun(李雪春), Zhao Shu-Xia(赵书霞), and Wang You-Nian(王友年) Spatial variation behaviors of argon inductively coupled plasma during discharge mode transition 2012 Chin. Phys. B 21 075203

[1] Lieberman M A and Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing (2nd edn.) (New York: Wiley-Interscience)
[2] Hopwood J 1993 Appl. Phys. Lett. 62 940
[3] Ding W X, Huang W, Wang X D and Yu C X 1993 Phys. Rev. Lett. 70 170
[4] Ding W X, She H Q, Huang W and Yu C X 1994 Phys. Rev. Lett. 72 96
[5] Lee M H, Lee K H, Hyun D S and Chung C W 2007 Appl. Phys. Lett. 90 191502
[6] Singh S V 2008 J. Appl. Phys. 103 083303
[7] Lee M H and Chung C W 2010 Plasma Sources Sci. Technol. 19 015011
[8] Seo S H, Hong J I and Chang H Y 1999 Appl. Phys. Lett. 74 2776
[9] Seo S H, Hong J I, Bai K H and Chang H Y 1999 Phys. Plasmas 6 614
[10] Cunge G, Crowley B, Vender D and Turner M M 1999 Plasma Sources Sci. Technol. 8 576
[11] Chung C W and Chang H Y 2002 Appl. Phys. Lett. 80 1725
[12] Edamura M and Benck E 2003 J. Vac. Sci. Technol. A 21 470
[13] Singh S V, Kempkes P and Soltwisch H 2006 Appl. Phys. Lett. 89 161501
[14] Tsai C M, Lee A P and Kou C S 2006 J. Phys. D: Appl. Phys. 39 3821
[15] Singh S V and Pargmann C 2008 J. Appl. Phys. 104 083303
[16] Lee H C, Lee J K and Chung C W 2010 Phys. Plasmas 17 033506
[17] Lee Y W, Lee H L and Chung T H 2011 J. Appl. Phys. 109 113302
[18] Ostrikov K N, Xu S and Yu M Y 2000 J. Appl. Phys. 88 2269
[19] Xu S, Ostrikov K N, Low W and Lee S 2000 J. Vac. Sci. Technol. A 18 2185
[20] Xu s, Ostrikov K N, Li Y, Taskadze E L and Jones I R 2001 Phys. Plasmas 8 2549
[21] Gao F, Zhao S X, Li X S and Wang Y N 2010 Phys. Plasmas 17 103507
[22] Miyoshi Y, Petrovic Z L and Makabe T 2002 J. Phys. D: Appl. Phys. 35 454
[23] Ostrikov K N, Xu S and Shafiul Azam A B M 2002 J. Vac. Sci. Technol. A 20 251
[24] Czerwiec T and Graves D B 2004 J. Phys. D: Appl. Phys. 37 2827
[25] Tsakadze Z L, Ostrikov K, Tsakadze E L and Xu S 2005 J. Vac. Sci. Technol. A 23 440
[26] Daltrini A M, Moshkalev S A, Monteiro M J R, Besseler E, Kostryukov A and Machida M 2007 J. Appl. Phys. 101 073309
[27] Iordanova S and Koleva I 2007 J. Phys.: Conf. Ser. 63 012026
[28] Abdel-Rahman M, Schulz-con der Gathen V and Gans T 2007 J. Phys. D: Appl. Phys. 40 1678
[29] Hirao S, Hayashi Y and Makabe T 2008 IEEE Trans. Plasma Sci. 36 1410
[30] Daltrini A M, Moshkalev S A, Morgan T J, Piejak R B and Graham W G 2008 Appl. Phys. Lett. 92 061504
[31] O'Connell D, Niemi K, Zaka-ul-Islam M and Gans T 2009 J. Phys.: Conf. Ser. 162 012011
[32] Morishita S, Hayashi Y and Makabe T 2010 Plasma Sources Sci. Technol. 19 055007
[33] Kang D H, Lee D K, Kim K B and Lee J J 2004 Appl. Phys. Lett. 84 3283
[34] Zaka-ul-lslam, Niemi K, Gans T and O'Connell D 2011 Appl. Phys. Lett. 99 041501
[35] Gao F, Zhao S X, Li X S and Wang Y N 2009 Phys. Plasmas 16 113502
[36] Turner M M and Lieberman M A 1999 Plasma Sources Sci. Technol. 8 313
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