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Chin. Phys. B, 2012, Vol. 21(5): 057301    DOI: 10.1088/1674-1056/21/5/057301

Improving lithographic masks with the assistance of indentations

Guo Ying-Nana,Li Xu-Fengb,Pan Shia,Wang Qiaoa,Wang Shuoa,Wu Yong-Kuana
1. School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China;
2. School of Applied Science, Taiyuan University of Science and Technology, Taiyuan 030024, China
Abstract  Indentations etched on the output surface of a metallic mask are proposed to produce fine lithographic patterns with a resolution of 500 nm using the finite-difference time domain (FDTD) method. Such a designed mask is capable of enhancing near field lithography (NFL) resolution more than three times compared with the structure without indentations. The simulation results show that the interference disturbance between the adjacent lithographic channels can be eliminated efficiently by employing the indentations. As a straightforward consequence, the channel-to-channel interspaces can be shortened significantly, maintaining a uniform field distribution and high contrast.
Keywords:  surface plasmons      lithography      finite-difference time domain (FDTD) method  
Received:  03 September 2011      Revised:  27 April 2012      Published:  01 April 2012
PACS:  73.20.Mf (Collective excitations (including excitons, polarons, plasmons and other charge-density excitations))  
  42.82.Cr (Fabrication techniques; lithography, pattern transfer)  
  02.60.Cb (Numerical simulation; solution of equations)  
Fund: Project supported by the National Natural Science Foundation of China (Grant No. 10974025).

Cite this article: 

Guo Ying-Nan,Li Xu-Feng,Pan Shi,Wang Qiao,Wang Shuo,Wu Yong-Kuan Improving lithographic masks with the assistance of indentations 2012 Chin. Phys. B 21 057301

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