Experimental study on microdeposition of the copper thin film by femtosecond laser-induced forward transfer
Yang Li(杨丽)a)b)† and Wang Ching-Yue(王清月)b)
a Civil Aviation University of China, Tianjin 300300, China; b Ultrafast Laser Laboratory, School of Precision Instruments and Optoelectronics Engineering, Tianjin University, and Laboratory of Optoelectronic Information Technical Science, EMC, Tianjin 300072, China
Abstract The morphologies of the deposited dots on the 40 nm-thick copper film by the femtosecond laser-induced forward transfer that depend on the irradiated laser fluence have been studied, and the variations of orderliness of the diameter of deposited dots on the quartz substrate and forward ablated dot on the donor substrate with increasing pulse fluence have been obtained experimentally. The experimental results show that a thinner copper film would generate larger-sized ablated dot and deposited dot at the threshold fluence for transfer. By x-ray diffraction measurement, it is demonstrated that the crystal form of the transferred copper films is unaltered and the size of the crystallites is diminished.
Received: 29 March 2009
Revised: 07 June 2009
Accepted manuscript online:
Fund: Project supported
by the Key Grant Project of the Ministry of Education of the
People's Republic of China (Grant No 10410), National Natural
Science Fundation of China (Grant No 60572168) and Science Research
Start-up Fund of Civil Aviation University of
Cite this article:
Yang Li(杨丽) and Wang Ching-Yue(王清月) Experimental study on microdeposition of the copper thin film by femtosecond laser-induced forward transfer 2009 Chin. Phys. B 18 4292
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