Other articles related with "threshold voltage":
128502 Wei-Tai Gong(巩伟泰), Yan Li(李闫), Ya-Bin Sun(孙亚宾), Yan-Ling Shi(石艳玲), and Xiao-Jin Li(李小进)
  Investigation of degradation and recovery characteristics of NBTI in 28-nm high-k metal gate process
    Chin. Phys. B   2023 Vol.32 (12): 128502-128502 [Abstract] (126) [HTML 0 KB] [PDF 823 KB] (35)
37302 Meixia Cheng(程梅霞), Suzhen Luan(栾苏珍), Hailin Wang(王海林), and Renxu Jia(贾仁需)
  Design and research of normally-off β-Ga2O3/4H-SiC heterojunction field effect transistor
    Chin. Phys. B   2023 Vol.32 (3): 37302-037302 [Abstract] (320) [HTML 1 KB] [PDF 867 KB] (260)
18506 Guangbao Lu(陆广宝), Jun Liu(刘俊), Chuanguo Zhang(张传国), Yang Gao(高扬), and Yonggang Li(李永钢)
  Dynamic modeling of total ionizing dose-induced threshold voltage shifts in MOS devices
    Chin. Phys. B   2023 Vol.32 (1): 18506-018506 [Abstract] (410) [HTML 1 KB] [PDF 683 KB] (165)
96101 Chen Wang(王琛), Wenmo Lu(路文墨), Fengnan Li(李奉南), Qiaomei Luo(罗巧梅), and Fei Ma(马飞)
  Migration of weakly bonded oxygen atoms in a-IGZO thin films and the positive shift of threshold voltage in TFTs
    Chin. Phys. B   2022 Vol.31 (9): 96101-096101 [Abstract] (344) [HTML 0 KB] [PDF 5583 KB] (161)
56107 Si-De Song(宋思德), Guo-Zhu Liu(刘国柱), Qi He(贺琪), Xiang Gu(顾祥), Gen-Shen Hong(洪根深), and Jian-Wei Wu(吴建伟)
  Combined effects of cycling endurance and total ionizing dose on floating gate memory cells
    Chin. Phys. B   2022 Vol.31 (5): 56107-056107 [Abstract] (360) [HTML 1 KB] [PDF 1359 KB] (66)
17304 Liangliang Guo(郭亮良), Yuming Zhang(张玉明), Suzhen Luan(栾苏珍), Rundi Qiao(乔润迪), and Renxu Jia(贾仁需)
  Study on a novel vertical enhancement-mode Ga2O3 MOSFET with FINFET structure
    Chin. Phys. B   2022 Vol.31 (1): 17304-017304 [Abstract] (432) [HTML 0 KB] [PDF 820 KB] (94)
87305 Ruo-Han Li(李若晗), Wu-Xiong Fei(费武雄), Rui Tang(唐锐), Zhao-Xi Wu(吴照玺), Chao Duan(段超), Tao Zhang(张涛), Dan Zhu(朱丹), Wei-Hang Zhang(张苇杭), Sheng-Lei Zhao(赵胜雷), Jin-Cheng Zhang(张进成), and Yue Hao(郝跃)
  Investigation on threshold voltage of p-channel GaN MOSFETs based on p-GaN/AlGaN/GaN heterostructure
    Chin. Phys. B   2021 Vol.30 (8): 87305-087305 [Abstract] (534) [HTML 1 KB] [PDF 830 KB] (180)
48504 Xi-Ming Chen(陈喜明), Bang-Bing Shi(石帮兵), Xuan Li(李轩), Huai-Yun Fan(范怀云), Chen-Zhan Li(李诚瞻), Xiao-Chuan Deng(邓小川), Hai-Hui Luo(罗海辉), Yu-Dong Wu(吴煜东), and Bo Zhang(张波)
  Characteristics and mechanisms of subthreshold voltage hysteresis in 4H-SiC MOSFETs
    Chin. Phys. B   2021 Vol.30 (4): 48504- [Abstract] (477) [HTML 1 KB] [PDF 790 KB] (162)
47103 Si-De Song(宋思德), Su-Zhen Wu(吴素贞), Guo-Zhu Liu(刘国柱), Wei Zhao(赵伟), Yin-Quan Wang(王印权), Jian-Wei Wu(吴建伟), and Qi He(贺琪)
  Analysis on degradation mechanisms of normally-off p-GaN gate AlGaN/GaN high-electron mobility transistor
    Chin. Phys. B   2021 Vol.30 (4): 47103- [Abstract] (373) [HTML 1 KB] [PDF 2118 KB] (114)
47304 Qing Zhu(朱青), Xiao-Hua Ma(马晓华), Yi-Lin Chen(陈怡霖), Bin Hou(侯斌), Jie-Jie Zhu(祝杰杰), Meng Zhang(张濛), Mei Wu(武玫), Ling Yang(杨凌), Yue Hao(郝跃)
  Negative bias-induced threshold voltage instability and zener/interface trapping mechanism in GaN-based MIS-HEMTs
    Chin. Phys. B   2020 Vol.29 (4): 47304-047304 [Abstract] (639) [HTML 1 KB] [PDF 753 KB] (180)
18102 Ya-Chao Zhang(张雅超), Zhi-Zhe Wang(王之哲), Rui Guo(郭蕊), Ge Liu(刘鸽), Wei-Min Bao(包为民), Jin-Cheng Zhang(张进成), Yue Hao(郝跃)
  High-performance InAlGaN/GaN enhancement-mode MOS-HEMTs grown by pulsed metal organic chemical vapor deposition
    Chin. Phys. B   2019 Vol.28 (1): 18102-018102 [Abstract] (609) [HTML 1 KB] [PDF 1276 KB] (164)
17303 Dong Zhang(张东), Chenfei Wu(武辰飞), Weizong Xu(徐尉宗), Fangfang Ren(任芳芳), Dong Zhou(周东), Peng Yu(于芃), Rong Zhang(张荣), Youdou Zheng(郑有炓), Hai Lu(陆海)
  Investigation and active suppression of self-heating induced degradation in amorphous InGaZnO thin film transistors
    Chin. Phys. B   2019 Vol.28 (1): 17303-017303 [Abstract] (758) [HTML 1 KB] [PDF 528 KB] (208)
97308 Chong Wang(王冲), Xin Wang(王鑫), Xue-Feng Zheng(郑雪峰), Yun Wang(王允), Yun-Long He(何云龙), Ye Tian(田野), Qing He(何晴), Ji Wu(吴忌), Wei Mao(毛维), Xiao-Hua Ma(马晓华), Jin-Cheng Zhang(张进成), Yue Hao(郝跃)
  Characteristics and threshold voltage model of GaN-based FinFET with recessed gate
    Chin. Phys. B   2018 Vol.27 (9): 97308-097308 [Abstract] (811) [HTML 1 KB] [PDF 804 KB] (229)
118501 Hai-Yan Kang(康海燕), Hui-Yong Hu(胡辉勇), Bin Wang(王斌)
  Analytical threshold voltage model for strained silicon GAA-TFET
    Chin. Phys. B   2016 Vol.25 (11): 118501-118501 [Abstract] (752) [HTML 0 KB] [PDF 354 KB] (318)
108503 Shweta Tripathi
  A two-dimensional analytical modeling for channel potential and threshold voltage of short channel triple material symmetrical gate Stack (TMGS) DG-MOSFET
    Chin. Phys. B   2016 Vol.25 (10): 108503-108503 [Abstract] (613) [HTML 1 KB] [PDF 5433 KB] (683)
47305 Fan-Yu Liu(刘凡宇), Heng-Zhu Liu(刘衡竹), Bi-Wei Liu(刘必慰), Yu-Feng Guo(郭宇峰)
  An analytical model for nanowire junctionless SOI FinFETs with considering three-dimensional coupling effect
    Chin. Phys. B   2016 Vol.25 (4): 47305-047305 [Abstract] (700) [HTML 1 KB] [PDF 663 KB] (620)
38502 Yan-hui Xin(辛艳辉), Sheng Yuan(袁胜), Ming-tang Liu(刘明堂),Hong-xia Liu(刘红侠), He-cai Yuan(袁合才)
  Two-dimensional models of threshold voltage andsubthreshold current for symmetrical double-material double-gate strained Si MOSFETs
    Chin. Phys. B   2016 Vol.25 (3): 38502-038502 [Abstract] (723) [HTML 1 KB] [PDF 339 KB] (304)
106102 Guan Rong-Hua (关荣华), Ye Wen-Jiang (叶文江), Xing Hong-Yu (邢红玉)
  Influences of surface and flexoelectric polarization on the effective anchoring energy in nematic liquid crystal
    Chin. Phys. B   2015 Vol.24 (10): 106102-106102 [Abstract] (610) [HTML 1 KB] [PDF 347 KB] (297)
57702 Chen Jian (陈键), Du Gang (杜刚), Liu Xiao-Yan (刘晓彦)
  Threshold switching uniformity in In2Se3 nanowire-based phase change memory
    Chin. Phys. B   2015 Vol.24 (5): 57702-057702 [Abstract] (596) [HTML 1 KB] [PDF 684 KB] (419)
37303 Fan Min-Min (范敏敏), Xu Jing-Ping (徐静平), Liu Lu (刘璐), Bai Yu-Rong (白玉蓉), Huang Yong (黄勇)
  Influences of fringing capacitance on threshold voltage and subthreshold swing of a GeOI metal-oxide-semiconductor field-effect transistor
    Chin. Phys. B   2015 Vol.24 (3): 37303-037303 [Abstract] (768) [HTML 0 KB] [PDF 304 KB] (482)
118505 Shweta Tripathi
  A two-dimensional analytical model for channel potential and threshold voltage of short channel dual material gate lightly doped drain MOSFET
    Chin. Phys. B   2014 Vol.23 (11): 118505-118505 [Abstract] (645) [HTML 1 KB] [PDF 332 KB] (437)
77102 Lü Yuan-Jie (吕元杰), Feng Zhi-Hong (冯志红), Gu Guo-Dong (顾国栋), Dun Shao-Bo (敦少博), Yin Jia-Yun (尹甲运), Han Ting-Ting (韩婷婷), Sheng Bai-Cheng (盛百城), Cai Shu-Jun (蔡树军), Liu Bo (刘波), Lin Zhao-Jun (林兆军)
  Directly extracting both threshold voltage and series resistance from conductance-voltage curve for AlGaN/GaN Schottky diode
    Chin. Phys. B   2013 Vol.22 (7): 77102-077102 [Abstract] (864) [HTML 1 KB] [PDF 270 KB] (1492)
28503 Wang Bin (王斌), Zhang He-Ming (张鹤鸣), Hu Hui-Yong (胡辉勇), Zhang Yu-Ming (张玉明), Zhou Chun-Yu (周春宇), Wang Guan-Yu (王冠宇), Li Yu-Chen (李妤晨 )
  Effect of substrate doping on the flatband and threshold voltages of strained-Si pMOSFET
    Chin. Phys. B   2013 Vol.22 (2): 28503-028503 [Abstract] (835) [HTML 1 KB] [PDF 390 KB] (1312)
107306 Ma Fei (马飞), Liu Hong-Xia (刘红侠), Fan Ji-Bin (樊继斌), Wang Shu-Long (王树龙)
  A two-dimensional threshold voltage analytical model for metal-gate/high-k/SiO2/Si stacked MOSFETs
    Chin. Phys. B   2012 Vol.21 (10): 107306-107306 [Abstract] (1028) [HTML 1 KB] [PDF 197 KB] (978)
57304 Ma Fei(马飞), Liu Hong-Xia(刘红侠), Kuang Qian-Wei(匡潜玮), and Fan Ji-Bin(樊继斌)
  A threshold voltage analytical model for high-k gate dielectric MOSFETs with fully overlapped lightly doped drain structures
    Chin. Phys. B   2012 Vol.21 (5): 57304-057304 [Abstract] (1638) [HTML 1 KB] [PDF 180 KB] (2174)
27303 Ma Xiao-Hua(马晓华), Yu Hui-You(于惠游), Quan Si(全思), Yang Li-Yuan(杨丽媛), Pan Cai-Yuan(潘才渊), Yang Ling(杨凌), Wang Hao(王昊), Zhang Jin-Cheng(张进成), and Hao Yue(郝跃)
  Enhancement-mode AlGaN/GaN high electronic mobility transistors with thin barrier
    Chin. Phys. B   2011 Vol.20 (2): 27303-027303 [Abstract] (1673) [HTML 1 KB] [PDF 838 KB] (1069)
117309 Qin Shan-Shan(秦珊珊), Zhang He-Ming(张鹤鸣), Hu Hui-Yong(胡辉勇), Dai Xian-Ying(戴显英), Xuan Rong-Xi(宣荣喜), and Shu Bin(舒斌)
  An analytical threshold voltage model for dual-strained channel PMOSFET
    Chin. Phys. B   2010 Vol.19 (11): 117309-117309 [Abstract] (1249) [HTML 0 KB] [PDF 694 KB] (892)
5479 Hu Shi-Gang(胡仕刚),Hao Yue(郝跃), Ma Xiao-Hua(马晓华), Cao Yan-Rong(曹艳荣), Chen Chi(陈炽), and Wu Xiao-Feng(吴笑峰)
  Study on the degradation of NMOSFETs with ultra-thin gate oxide under channel hot electron stress at high temperature
    Chin. Phys. B   2009 Vol.18 (12): 5479-5484 [Abstract] (1619) [HTML 1 KB] [PDF 169 KB] (976)
238 Ye Wen-Jiang(叶文江), Xing Hong-Yu(邢红玉), Yang Guo-Chen(杨国琛), and Yuan Meng-Yao(苑梦尧)
  Threshold property of a nematic liquid crystal cell with two grating surface substrates
    Chin. Phys. B   2009 Vol.18 (1): 238-245 [Abstract] (1197) [HTML 1 KB] [PDF 568 KB] (923)
1887 Yuan Guang-Cai(袁广才), Xu Zheng(徐征), Zhao Su-Ling(赵谡玲), Zhang Fu-Jun(张福俊), Jiang Wei-Wei(姜薇薇), Song Dan-Dan(宋丹丹), Zhu Hai-Na(朱海娜), Li Shao-Yan(李少彦), Huang Jin-Ying(黄金英), Huang Hao(黄豪), and Xu Xu-Rong(徐叙瑢)
  Characteristics of pentacene organic thin film transistor with top gate and bottom contact
    Chin. Phys. B   2008 Vol.17 (5): 1887-1892 [Abstract] (1492) [HTML 1 KB] [PDF 269 KB] (975)
1757 Ji Feng (季峰), Xu Jing-Ping(徐静平), and Lai Pui-To (黎沛涛)
  A threshold voltage model for high-k gate-dielectric MOSFETs considering fringing-field effect
    Chin. Phys. B   2007 Vol.16 (6): 1757-1763 [Abstract] (1386) [HTML 1 KB] [PDF 509 KB] (595)
821 Chen Hai-Feng(陈海峰), Hao Yue(郝跃), Ma Xiao-Hua(马晓华), Li Kang(李康), and Ni Jin-Yu(倪金玉)
  Hot-carrier degradation for 90nm gate length LDD-NMOSFET with ultra-thin gate oxide under low gate voltage stress
    Chin. Phys. B   2007 Vol.16 (3): 821-825 [Abstract] (1622) [HTML 1 KB] [PDF 489 KB] (749)
565 Zheng Zhong-Shan (郑中山), Liu Zhong-Li (刘忠立), Zhang Guo-Qiang (张国强), Li Ning (李宁), Fan Kai (范楷), Zhang En-Xia (张恩霞), Yi Wan-Bing (易万兵), Chen Meng (陈猛), Wang Xi (王曦)
  Effect of the technology of implanting nitrogen into buried oxide on the radiation hardness of the top gate oxide for partially depleted SOI PMOSFET
    Chin. Phys. B   2005 Vol.14 (3): 565-570 [Abstract] (1294) [HTML 1 KB] [PDF 279 KB] (970)
1815 Tong Jian-Nong (童建农), Zou Xue-Cheng (邹雪城), Shen Xu-Bang (沈绪榜)
  Influence of structural parameters on the immunity of short-channel effects in grooved-gate nMOSFET
    Chin. Phys. B   2004 Vol.13 (11): 1815-1819 [Abstract] (1165) [HTML 1 KB] [PDF 212 KB] (416)
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