Compact TE-pass polarizer based on lithium-niobate-on-insulator assisted by indium tin oxide and silicon nitride
Jia-Min Liu(刘家敏) and De-Long Zhang(张德龙)†
Department of Opto-electronics and Information Engineering, School of Precision Instruments and Opto-electronics Engineering, Key Laboratory of Optoelectronic Information Technology(Ministry of Education), and Key Laboratory of Micro-Opto-Electro-Mechanical Systems(MOEMS) Technology(Ministry of Education), Tianjin University, Tianjin 300072, China
Abstract An indium tin oxide (ITO) and silicon nitride (Si3N4) assisted compact TE-pass waveguide polarizer based on lithium-niobate-on-insulator is proposed and numerically analyzed. By properly designing the ITO and Si3N4 assisted structure and utilizing the epsilon-near-zero effect of ITO, the TM mode is strongly confined in the ITO layer with extremely high loss, while the TE mode is hardly affected and passes through the waveguide with low loss. The simulation results show that the polarizer has an extinction ratio of 22.5 dB and an insertion loss of 0.8 dB at the wavelength of 1.55 μm, and has an operating bandwidth of about 125 nm (from 1540 nm to 1665 nm) for an extinction ratio of >20 dB and an insertion loss of <0.95 dB. Moreover, the proposed device exhibits large fabrication tolerances. More notably, the device is compact, with a length of only 7.5 μm, and is appropriate for on-chip applications.
Jia-Min Liu(刘家敏) and De-Long Zhang(张德龙) Compact TE-pass polarizer based on lithium-niobate-on-insulator assisted by indium tin oxide and silicon nitride 2023 Chin. Phys. B 32 064208
[1] Zhu D, Shao L, Yu M, Cheng R, Desiatov B, Xin C J, Hu Y, Holzgrafe J, Ghosh S, Shams Ansari A, Puma E, Sinclair N, Reimer C, Zhang M and Lončar M2021 Adv. Opt. Photon.13 242 [2] Wang Z, Fang Z, Liu Z, Chu W, Zhou Y, Zhang J, Wu R, Wang M, Lu T and Cheng Y2021 Opt. Lett.46 380 [3] Wang C, Zhang M, Chen X, Bertrand M, Shams-Ansari A, Chandrasekhar S, Winzer P and Lončar M2018 Nature562 101 [4] Yang F, Fang X, Chen X, Zhu L, Zhang F, Chen Z and Li Y2022 Chin. Opt. Lett.20 022502 [5] Cai L T, Mahmoud A, Khan M, Mahmoud M, Mukherjee T, Bain J and Piazza G2019 Photon. Res.7 1003 [6] Tian X H, Zhou W, Ren K Q, Zhang C, Liu X, Xue G T, Duan J C, Cai X, Hu X, Gong Y X, Xie Z and Zhu S N2021 Chin. Opt. Lett.19 060015 [7] Xue G T, Tian X H, Zhang C, Xie Z, Xu P, Gong Y X and Zhu S N2021 Chin. Phys. B30 110313 [8] Ge D H, Zhou Y J, Lv M C, Shi J K, Babangida A A, Zhang L Q and Zhu S N2022 Chin. Phys. B31 44102 [9] Cortes Herrera L, He X, Cardenas J and Agrawal G P2021 Opt. Express29 44174 [10] Xu Q, Chen F, Xue S D, Liu J M, Zhang D L and Hua P R2022 Phys. E136 115028 [11] Zhang L, Zhang L, Fu X and Yang L2020 IEEE Photonics J.12 1 [12] Deng C, Lu M, Sun Y, Huang L, Wang D, Hu G, Zhang R, Yun B and Cui Y2021 Opt. Express29 11627 [13] Chen Z, Yang J, Wong W H, Pun E Y B and Wang C2021 Photon. Res.9 2319 [14] Saitoh E, Kawaguchi Y, Saitoh K and Koshiba M2013 IEEE Photon. J.5 6600610 [15] Liu Y, Huang X, Li Z, Kuang Y, Guan H, Wei Q, Fan Z and Li Z2020 Opt. Lett.45 4915 [16] Yu W, Dai S, Zhao Q, Li J and Liu J2019 Opt. Express27 34857 [17] Dai S, Yu W, Zhao Y, Li M, Li J, Zhang Z and Liu J2021 IEEE Photon. J.13 1 [18] Wu J, Xie Z T, Sha Y, Fu H Y and Li Q2021 Photon. Res.9 1616 [19] Liu X, Zang K, Kang J H, Park J, Harris J S, Kik P G and Brongersma M L2018 ACS Photon.5 4484 [20] Lee H W, Papadakis G, Burgos S P, Chander K, Kriesch A, Pala R, Peschel U and Atwater H A2014 Nano Lett.14 6463 [21] Capretti A, Wang Y, Engheta N and Dal Negro L2015 Opt. Lett.40 1500 [22] Jiang X, Lu H, Li Q, Zhou H, Zhang S and Zhang H2018 Nanophotonics7 1835 [23] Almeida V R, Xu Q, Barrios C A and Lipson M2004 Opt. Lett.29 1209 [24] Hu C, Pan A, Li T, Wang X, Liu Y, Tao S, Zeng C and Xia J2021 Opt. Express29 5397 [25] Wang Y, Chen Z and Hu H2018 Crystals8 191 [26] Malitson I H1965 J. Opt. Soc. Am.55 1205 [27] Luke K, Okawachi Y, Lamont M R E, Gaeta A L and Lipson M2015 Opt. Lett.40 4823 [28] Zelmon D E, Small D L and Jundt D1997 J. Opt. Soc. Am. B14 3319 [29] Zhu Z and Brown T G2002 Opt. Express10 853 [30] Zafar H, Moreira P, Taha A M, Paredes B, Dahlem M S and Khilo A2018 Opt. Express26 31850 [31] Sullivan D M2000 Electromagnetic simulation using the FDTD method (New York: IEEE Press)
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