Fabrication of microresonators by using photoresist developer as etchant

doi:10.1088/1674-1056/abf112

Abstract In superconducting circuit, microwave resonators and capacitors are crucial components, and their quality has a strong impact on circuit performance. Here we develop a novel wet etching process to define these two components using common photoresist developer as etchant. This method reduces subsequent steps and can be completed immediately after development. By measuring the internal quality factor of resonators, we show that it is possible to achieve similar or better performance when compared with samples made by standard etching processes. This easy-to-implement method may boost the yield hence providing an alternative fabrication process for microwave resonators and capacitors.

Keywords: superconducting qubit microresonator easy-to-implement high quality factors

Received: 18 November 2020
Revised: 02 March 2021
Accepted manuscript online: 23 March 2021

PACS:	03.67.Lx	(Quantum computation architectures and implementations)
	85.25.Am	(Superconducting device characterization, design, and modeling)

Fund: Project supported by the National Key R&D Program of China (Grant No. 2016YFA0301802), the National Natural Science Foundation of China (Grant Nos. 61521001 and 11890704), and the Key R&D Program of Guangdong Province, China (Grant No. 2018B030326001).

Corresponding Authors: Yang Yu
E-mail: yuyang@nju.edu.cn

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Shu-Qing Song(宋树清), Jian-Wen Xu(徐建文), Zhi-Kun Han(韩志坤), Xiao-Pei Yang(杨晓沛), Yu-Ting Sun(孙宇霆), Xiao-Han Wang(王晓晗), Shao-Xiong Li(李邵雄), Dong Lan(兰栋), Jie Zhao(赵杰), Xin-Sheng Tan(谭新生), and Yang Yu(于扬) Fabrication of microresonators by using photoresist developer as etchant 2021 Chin. Phys. B 30 060313

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Fabrication of microresonators by using photoresist developer as etchant

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