Ultra-thin a-SiNx protective overcoats for hard disks and read/write heads
Ding Wan-Yu(丁万昱)a)b)†, Xu Jun(徐军)a), Lu Wen-Qi(陆文琪)a), Deng Xin-Lu(邓新绿)a), and Dong Chuang(董闯)a)
a State Key Laboratory of Material Modification by Laser, Ion and Electron Beams,Dalian University of Technology, Dalian 116024, China; b Institute of Optoelectronic Materials and Device, School of Materials Science and Engineering, Dalian Jiaotong University, Dalian 116028, China
Abstract This paper reports that amorphous silicon nitride ($a$-SiN$_{x})$ overcoats were deposited at room temperature by microwave ECR plasma enhanced unbalanced magnetron sputtering. The 2 nm $a$-SiN$_{x}$ overcoat has better anti-corrosion properties than that of reference $a$-CN$_{x}$ overcoats (2--4.5 nm). The superior anti-corrosion performance is attributed to its stoichiometric bond structure, where 94.8% Si atoms form Si--N asymmetric stretching vibration bonds. The N/Si ratio is 1.33 as in the stoichiometry of Si$_{3}$N$_{4}$ and corresponds to the highest hardness of 25.0 GPa. The surface is atomically smooth with RMS $<0.2$ nm. The ultra-thin $a$-SiN$_{x}$ overcoats are promising for hard disks and read/write heads protective coatings.
Received: 09 August 2008
Revised: 14 September 2008
Accepted manuscript online:
Fund: Project supported by the Major
Program of the National Natural Science Foundation of China (Grant
No 50390060) and the National Natural Science Foundation of China
(Grant Nos 60576022 and 50572012).
Cite this article:
Ding Wan-Yu(丁万昱), Xu Jun(徐军), Lu Wen-Qi(陆文琪), Deng Xin-Lu(邓新绿), and Dong Chuang(董闯) Ultra-thin a-SiNx protective overcoats for hard disks and read/write heads 2009 Chin. Phys. B 18 1570
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