The charging stability of different silica glasses studied by measuring the secondary electron emission yield

doi:10.1088/1674-1056/20/3/037901

Abstract This paper reports that the charging properties of lead silica, Suprasil silica and Infrasil silica are investigated by measuring the secondary electron emission (SEE) yield. At a primary electron beam energy of 25 keV, the intrinsic SEE yields measured at very low injection dose are 0.54, 0.29 and 0.35, respectively for lead silica, Suprasil and Infrasil silica glass. During the first e-beam irradiation at a high injection current density, the SEE yields of lead silica and Suprasil increase continuously and slowly from their initial values to a steady state. At the steady state, the SEE yields of lead silica and Suprasil are 0.94 and 0.93, respectively. In Infrasil, several charging and discharging processes are observed during the experiment. This shows that Infrasil does not reach its steady state. Two hours later, all samples are irradiated again in the same place as the first irradiation at a low current density and low dose. The SEE yields of lead silica, Suprasil and Infrasil are 0.69, 0.76 and 0.55, respectively. Twenty hours later, the values are 0.62, 0.64 and 0.33, respectively, for lead silica, Suprasil and Infrasil. These results show that Infrasil has poor charging stability. Comparatively, the charging stability of lead silica is better, and Suprasil has the best characteristics.

Keywords: secondary electron emission yield charging stability nonlinear silica glass

Received: 08 December 2009
Revised: 15 October 2010
Accepted manuscript online:

PACS:	79.20.Fr
	77.22.Jp	(Dielectric breakdown and space-charge effects)
	42.65.Ky	(Frequency conversion; harmonic generation, including higher-order harmonic generation)

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Zhao Su-Ling(赵谡玲) and Bertrand Poumellec The charging stability of different silica glasses studied by measuring the secondary electron emission yield 2011 Chin. Phys. B 20 037901

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