Preparation and structural properties of thin carbon films by very-high-frequency magnetron sputtering

doi:10.1088/1674-1056/25/7/075202

Abstract Growth and structural properties of thin a-C films prepared by the 60 MHz very-high-frequency (VHF) magnetron sputtering were investigated. The energy and flux of ions impinging the substrate were also analyzed. It is found that the thin a-C films prepared by the 60 MHz sputtering have a lower growth rate, a smooth surface, and more sp³ contents. These features are related to the higher ion energy and the lower ions flux onto the substrate. Therefore, the 60 MHz VHF sputtering is more suitable for the preparation of thin a-C film with more sp³ contents.

Keywords: carbon thin films very-high-frequency sputtering structural properties

Received: 25 January 2016
Revised: 07 March 2016
Accepted manuscript online:

PACS:	52.80.Pi	(High-frequency and RF discharges)
	81.15.Cd	(Deposition by sputtering)
	68.55.-a	(Thin film structure and morphology)

Fund: Project supported by the National Natural Science Foundation of China (Grant No. 11275136).

Corresponding Authors: Chao Ye
E-mail: cye@suda.edu.cn

Cite this article:

Ming-Wei Gao(高明伟), Chao Ye(叶超), Xiang-Ying Wang(王响英), Yi-Song He(何一松), Jia-Min Guo(郭佳敏), Pei-Fang Yang(杨培芳) Preparation and structural properties of thin carbon films by very-high-frequency magnetron sputtering 2016 Chin. Phys. B 25 075202

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Preparation and structural properties of thin carbon films by very-high-frequency magnetron sputtering

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