Abstract Symmetric tapered dielectric structures in metal have demonstrated applications such as the nanofocusing of surface plasmon polaritons, as well as the waveguiding of V-channel polaritons. Yet the fabrication of smooth-surfaced tapered structure remains an obstacle to most researchers. We have successfully developed a handy method to fabricate metal-sandwiched tapered nanostructures simply with electron beam lithography. Though these structures are slightly different from conventional symmetric V-shaped structures, systematic simulations show that similar functionality of surface plasmon polariton nanofocusing can still be achieved. When parameters are properly selected, wavelength-selective nanofocusing of surface plasmon polaritons can be obtained.
Received: 19 April 2009
Revised: 30 May 2009
Accepted manuscript online:
PACS:
73.20.Mf
(Collective excitations (including excitons, polarons, plasmons and other charge-density excitations))
Fund: Project supported by the National
Natural Science Foundation of China (Grant Nos 90606023, 10574003
and 20731160012), a National 973 Project (Grant No 2007CB936202 and
2009CB623703) and MOST from China's Ministry of Science and
Technology and Hong Kong's NSFC/RGC Joint Research Scheme (Project
No N_-HKUST615/06).
Cite this article:
Zhang Yang(张洋),Zhao Qing(赵清),Liao Zhi-Min(廖志敏), and Yu Da-Peng(俞大鹏) Tapered dielectric structure in metal as a wavelength-selective surface plasmon polariton focuser 2009 Chin. Phys. B 18 4865
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