Enhanced field emission characteristics of thin-Au-coated nano-sheet carbon films
Gu Guang-Rui(顾广瑞)a)† and Ito Toshimichi(伊藤利道)b)
a Department of Physics, College of Science, Yanbian University, Yanji 133002, China; b Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, Osaka 565-0871, Japan
Abstract This paper reports that the nano-sheet carbon films (NSCFs) were fabricated on Si wafer chips with hydrogen--methane gas mixture by means of quartz-tube-type microwave plasma chemical vapour deposition (MWPCVD). In order to further improve the field emission (FE) characteristics, a 5-nm Au film was prepared on the samples by using electron beam evaporation. The FE properties were obviously improved due to depositing Au thin film on NSCFs. The FE current density at a macroscopic electric field, E, of 9 V/μm was increased from 12.4 mA/cm2 to 27.2 mA/cm2 and the threshold field was decreased from 2.6 V/μm to 2.0 V/μm for Au-coated carbon films. A modified F-N model considering statistic effects of FE tip structures in the low E region and a space-charge-limited-current effect in the high E region were applied successfully to explain the FE data of the Au-coated NSCF.
Received: 30 January 2009
Revised: 23 March 2009
Accepted manuscript online:
PACS:
79.70.+q
(Field emission, ionization, evaporation, and desorption)
(Methods of micro- and nanofabrication and processing)
Cite this article:
Gu Guang-Rui(顾广瑞) and Ito Toshimichi(伊藤利道) Enhanced field emission characteristics of thin-Au-coated nano-sheet carbon films 2009 Chin. Phys. B 18 4547
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