Numerical simulation of chemical processes in helium plasmas in atmosphere environment
Ouyang Jian-Ming (欧阳建明)ab, Guo Wei (郭伟)b, Wang Long (王龙)b, Shao Fu-Qiu (邵福球)a
a National University of Defence Science and Technology, Changsha 410073, China; b Institute of Physics, Chinese Academy of Sciences, Beijing 100080, China
Abstract A model is built to study chemical processes in plasmas generated in helium with trace amounts of air at atmospheric pressure or low pressures. The plasma lifetimes and the temporal evolutions of the main charged species are presented. The plasma lifetimes are longer than that in air plasma at atmospheric pressure, but this is not true at low pressures. The electron number density does not strictly obey the exponential damping law in a longer period.
Received: 04 June 2004
Revised: 30 August 2004
Accepted manuscript online:
Ouyang Jian-Ming (欧阳建明), Guo Wei (郭伟), Wang Long (王龙), Shao Fu-Qiu (邵福球) Numerical simulation of chemical processes in helium plasmas in atmosphere environment 2005 Chinese Physics 14 154
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