Chin. Phys. B
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Chin. Phys. B  2020, Vol. 29 Issue (4): 047501    DOI: 10.1088/1674-1056/ab7800
CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES Current Issue| Next Issue| Archive| Adv Search |
Nanofabrication of 50 nm zone plates through e-beam lithography with local proximity effect correction for x-ray imaging
Jingyuan Zhu(朱静远)1, Sichao Zhang(张思超)1, Shanshan Xie(谢珊珊)1, Chen Xu(徐晨)1, Lijuan Zhang(张丽娟)2, Xulei Tao(陶旭磊)2, Yuqi Ren(任玉琦)2, Yudan Wang(王玉丹)2, Biao Deng(邓彪)2, Renzhong Tai(邰仁忠)2, Yifang Chen(陈宜方)1
1 Nanolithography and Application Research Group, State Key Laboratory of Asic and System, School of Information Science and Engineering, Fudan University, Shanghai 200433, China;
2 Shanghai Synchrotron Radiation Facility, Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201204, China

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